SCHEMBL5002156

SCHEMBL5002156

[O-][S+](CCC12CCC(CC1)C2)CCC12CCC(CC1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3612425 0.78 GRIN2D (0.36)
SCHEMBL891886 0.70 MEN1 (0.38)
SCHEMBL10787067 0.70 GRIN2D (0.31)
SCHEMBL222556 0.70 GRIN2D (0.31)
SCHEMBL11717577 0.70 GRIN2D (0.58)
SCHEMBL2356470 0.67 MEN1 (0.42)
SCHEMBL17161314 0.65 GRIN2D (0.42)
SCHEMBL10953740 0.65
SCHEMBL9272905 0.65 ALDH1A1 (0.35)
SCHEMBL31258654 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed