Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | DRD4 | P21917 | 12/20 | 0.37 |
| ▸ | DRD2 | P14416 | 2/20 | 0.37 |
| ▸ | DRD3 | P35462 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | HTR4 | Q13639 | 1/20 | 0.35 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | CACNA1H | O95180 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL499881 | 0.86 | GLA (0.42) | GLADRD4DRD2DRD3PDK1 | |
| SCHEMBL499961 | 0.82 | GLA (0.45) | GLADRD4DRD2DRD3TDP1 | |
| SCHEMBL500357 | 0.81 | GLA (0.50) | GLADRD4DRD3ALDH1A1CACNA1H | |
| SCHEMBL27655758 | 0.80 | DRD4 (0.37) | DRD4DRD2DRD3PDK1CYP1A2 | |
| SCHEMBL500411 | 0.79 | GLA (0.45) | GLADRD4DRD2DRD3ALDH1A1 | |
| SCHEMBL20750562 | 0.78 | DRD3 (0.43) | GLADRD4DRD2DRD3CYP1A2 | |
| SCHEMBL4190132 | 0.77 | GLA (0.41) | GLADRD4DRD2DRD3PDK1 | |
| SCHEMBL18531912 | 0.75 | CCR2 (0.40) | GLADRD4DRD2DRD3PDK1 | |
| SCHEMBL16508846 | 0.75 | DRD4 (0.38) | DRD4DRD2DRD3PDK1 | |
| SCHEMBL499919 | 0.74 | GLA (0.46) | GLADRD4DRD2DRD3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |