SCHEMBL5004422

SCHEMBL5004422

C#Cc1c(C(=O)O)cccc1C(=O)O.c1cc2ccc1-2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN22 Q9Y2R2 3/20 0.47
ALDH1A1 P00352 4/20 0.46
ALOX15 P16050 1/20 0.46
CDC25B P30305 1/20 0.46
ATM Q13315 1/20 0.46
TSHR P16473 1/20 0.45
ACMSD Q8TDX5 3/20 0.43
PTPRC P08575 1/20 0.42
PTPN9 P43378 1/20 0.42
PTPN11 Q06124 1/20 0.42
HNF4A P41235 3/20 0.41
DHFR P00374 1/20 0.41
MCL1 Q07820 1/20 0.41
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
MAPT P10636 1/20 0.41
DHODH Q02127 3/20 0.40
KDM4E B2RXH2 1/20 0.40
CA12 O43570 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1712400 0.94 ALDH1A1 (0.52) PTPN22ALDH1A1ALOX15TSHRPTPRC
Hydrochloric Acid SCHEMBL6349434 0.91 ALDH1A1 (0.50) PTPN22ALDH1A1ALOX15TSHRPTPRC
SCHEMBL2707738 0.88 ACMSD (0.49) PTPN22ALDH1A1ALOX15TSHRACMSD
Hydrochloric Acid SCHEMBL2746712 0.86 ACMSD (0.47) PTPN22ALDH1A1ALOX15TSHRACMSD
Hydrochloric Acid SCHEMBL2709681 0.86 ACMSD (0.47) PTPN22ALDH1A1ALOX15TSHRACMSD
SCHEMBL5667744 0.84 PTPN22 (0.40) PTPN22ALDH1A1ALOX15CDC25BATM
SCHEMBL5668193 0.83 HSD17B10 (0.48) PTPN22ALDH1A1ALOX15TSHRPTPRC
Anthracene SCHEMBL28428432 0.82 NR4A1 (0.50) PTPN22ALDH1A1ALOX15CDC25BTSHR
SCHEMBL2200319 0.82 ALDH1A1 (0.44) PTPN22ALDH1A1ALOX15TSHRPTPRC
SCHEMBL30626597 0.82 ALDH1A1 (0.44) PTPN22ALDH1A1ALOX15TSHRPTPRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed