Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR35 | Q9HC97 | 4/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | NAAA | Q02083 | 2/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | BCHE | P06276 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP12 | P39900 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5006443 | 1.00 | GPR35 (0.41) | GPR35EPHX1CYP2C19CA12CA1 | |
| SCHEMBL6104825 | 0.98 | GPR35 (0.40) | GPR35EPHX1CYP2C19CA12CA1 | |
| SCHEMBL6316283 | 0.83 | GPR35 (0.34) | GPR35 | |
| SCHEMBL28453292 | 0.82 | EPHX1 (0.41) | GPR35EPHX1CYP2C19CA12CA1 | |
| SCHEMBL13888379 | 0.81 | GPR35 (0.33) | GPR35 | |
| SCHEMBL2719080 | 0.81 | GPR35 (0.31) | GPR35 | |
| SCHEMBL375167 | 0.81 | EPHX1 (0.42) | GPR35EPHX1CYP2C19CA12CA1 | |
| SCHEMBL21123289 | 0.80 | GPR35 (0.31) | GPR35 | |
| SCHEMBL25172279 | 0.79 | MAPT (0.43) | GPR35EPHX1CYP19A1HTTNPC1 | |
| SCHEMBL23005764 | 0.78 | EPHX1 (0.44) | GPR35EPHX1CYP2C19CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117882008-A | Positive photosensitive resin composition | 日保丽公司 | 2024-04-12 | — | — | CN | disclosed |
| WO-2024009732-A1 | POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION | 日本ポリテック株式会社 | 2024-01-11 | — | — | WO | disclosed |
| WO-2023080254-A1 | POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION | 株式会社レゾナック | 2023-05-11 | — | — | WO | disclosed |
| US-10833351-B2 | Solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery, and methods for manufacturing solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery | FUJIFILM CORPORATION (JP) | 2020-11-10 | — | — | US | disclosed |
| US-20190006700-A1 | SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE-CONTAINING SHEET, ALL-SOLID STATE SECONDARY BATTERY, AND METHODS FOR MANUFACTURING SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE-CONTAINING SHEET, ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| CN-108780918-A | Solid electrolyte composition, sheet containing solid electrolyte, all-solid-state secondary battery, solid electrolyte composition, sheet containing solid electrolyte, and method for producing all-solid-state secondary battery | 富士胶片株式会社 | 2018-11-09 | — | — | CN | disclosed |
| US-20180088073-A1 | GAS SENSOR AND METHOD OF MANUFACTURE THEREOF | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-03-29 | — | — | US | disclosed |
| US-20180088073-A1 | GAS SENSOR AND METHOD OF MANUFACTURE THEREOF | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-03-29 | — | — | US | disclosed |
| US-20180031975-A1 | PATTERN TREATMENT METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-02-01 | — | — | US | disclosed |
| US-20180031975-A1 | PATTERN TREATMENT METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-02-01 | — | — | US | disclosed |
| US-7470808-B2 | Method for producing fluorine-containing acrylate | TOSOH F-TECH, INC. (JP) | 2008-12-30 | — | — | US | disclosed |
| US-7470808-B2 | Method for producing fluorine-containing acrylate | TOSOH F-TECH, INC. (JP) | 2008-12-30 | — | — | US | disclosed |
| US-7470808-B2 | Method for producing fluorine-containing acrylate | TOSOH F-TECH, INC. (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20070083021-A1 | Fluorocopolymer, method for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-04-12 | — | — | US | disclosed |
| US-20070083021-A1 | Fluorocopolymer, method for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-04-12 | — | — | US | disclosed |
| US-20060122423-A1 | Method for producing fluorine-containing acrylate | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 2006-06-08 | — | — | US | disclosed |
| EP-1637514-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING ACRYLATE | Tosoh F-Tech, Inc. (JP) | 2006-03-22 | — | — | EP | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | GPR35 1851/4885EPHX1 2610/4885CYP2C19 2474/4885 |
| US-20060122423-A1 | Method for producing fluorine-containing acrylate | AFF4, CBR1, AFF1 | GPR35 2657/4885EPHX1 1064/4885CYP2C19 319/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.