SCHEMBL5010074

SCHEMBL5010074

CCN(CC)c1ccc(C(c2ccc(N(CC)CC)cc2)c2ccccn2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 6/20 0.58
SLC6A2 P23975 6/20 0.58
SLC6A4 P31645 6/20 0.58
TSHR P16473 4/20 0.49
LMNA P02545 3/20 0.49
ADRA2A P08913 2/20 0.49
CYP2C9 P11712 2/20 0.49
ADRA1A P35348 2/20 0.49
OPRK1 P41145 2/20 0.49
HIF1A Q16665 2/20 0.49
KDM4E B2RXH2 1/20 0.49
ABCB11 O95342 1/20 0.49
ESR1 P03372 1/20 0.49
CYP3A4 P08684 1/20 0.49
PDE4A P27815 1/20 0.49
STAT6 P42226 1/20 0.49
GPR55 Q9Y2T6 1/20 0.49
CYP2D6 P10635 3/20 0.46
KCNA5 P22460 2/20 0.46
KCNE1 P15382 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6242658 0.84 KCNA5 (0.44) SLC6A2SLC6A4TSHRLMNAHIF1A
SCHEMBL11185219 0.81 SLC6A3 (0.63) SLC6A3SLC6A2SLC6A4TSHRLMNA
SCHEMBL20909494 0.81 SLC6A3 (0.50) SLC6A3SLC6A2SLC6A4TSHRLMNA
SCHEMBL13778790 0.78 MAPT (0.43) SLC6A3SLC6A2SLC6A4TSHRLMNA
SCHEMBL109699 0.77 CNR2 (0.53) TSHRKDM4ECYP3A4ALDH1A1NPC1
SCHEMBL27776204 0.77 CNR2 (0.53) TSHRKDM4ECYP3A4ALDH1A1NPC1
SCHEMBL131813 0.76 ALDH1A1 (0.56) TSHRCYP2C9KDM4ECYP3A4ALDH1A1
SCHEMBL4314634 0.75 CNR2 (0.52) TSHRKDM4ECYP3A4ALDH1A1NPC1
SCHEMBL15854854 0.75 SLC6A3 (0.70) SLC6A3SLC6A2SLC6A4TSHRLMNA
SCHEMBL3290275 0.74 SLC6A3 (1.00) SLC6A3SLC6A2SLC6A4TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-62297384-A None JP disclosed
JP-59195657-A None JP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1803034-A2 HOLOGRAPHIC STORAGE MEDIUM General Electric Company (US) 2007-07-04 EP disclosed
WO-2006044243-A2 HOLOGRAPHIC STORAGE MEDIUM GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) 2006-04-27 WO disclosed
US-20060078802-A1 Holographic storage medium SABIC INNOVATIVE PLASTICS IP B.V. 2006-04-13 US disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
JP-S62297384-A ORGANIC ELECTROCHROMIC MATERIAL TOMOEGAWA PAPER CO LTD 1987-12-24 JP disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
JP-S59195657-A ELECTROPHOTOGRAPHIC SENSITIVE BODY TOMOEGAWA PAPER CO LTD 1984-11-06 JP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed