SCHEMBL5010902

SCHEMBL5010902

CCCNC(=S)NCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1276262 0.91 ALDH1A1 (0.56)
SCHEMBL80644 0.85
SCHEMBL9666733 0.84 ALDH1A1 (0.65)
SCHEMBL5655081 0.84 ALDH1A1 (0.65)
SCHEMBL16372492 0.83 QPCT (0.50)
SCHEMBL20204692 0.82 ALDH1A1 (0.62)
SCHEMBL5075385 0.81
SCHEMBL14860830 0.81 KMT2A (0.53)
SCHEMBL11596858 0.80 ALDH1A1 (0.59)
SCHEMBL11594821 0.80 ALDH1A1 (0.59)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114106475-A Rubber composition for sealing material, and pneumatic tire 住友橡胶工业株式会社 2022-03-01 CN disclosed
WO-2016167511-A2 N2-(2-METHOXYPHENYL)PYRIMIDINE DERIVATIVE, METHOD FOR PREPARING SAME, AND PHARMACEUTICAL COMPOSITION FOR CANCER PREVENTION OR TREATMENT CONTAINING SAME AS ACTIVE INGREDIENT 한국화학연구원 2016-10-20 WO disclosed
US-7700581-B2 Cephalosporin compounds comprising a C3 thio-methyl moiety substituted with N-containing heterocyclic group, and a C7 thiourea acetamido group, their preparations and uses thereof GUANGZHOU BAIYUNSHAN PHARMACEUTICAL CO., LTD. (CN) 2010-04-20 US disclosed
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 US disclosed
US-20080182836-A1 Cephalosporin compounds comprising a C3 thio-methyl moiety substituted with N-containing heterocyclic group, and a C7 thiourea acetamido group, their preparations and uses thereof GUANGZHOU BAIYUNSHAN PHARMACEUTICAL CO., LTD. (CN) 2008-07-31 US disclosed
EP-1431813-B1 Photothermographic material with high iodide content and image forming method using same FUJI PHOTO FILM CO LTD (JP) 2007-02-14 EP disclosed
US-20040137389-A1 Heat-developable light-sensitive material FUJIFILM CORPORATION (JP) 2004-07-15 US disclosed
US-20040131983-A1 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2004-07-08 US disclosed
EP-1431813-A1 Photothermographic material and image forming method using same FUJI PHOTO FILM CO., LTD. (JP) 2004-06-23 EP disclosed
US-5246688-A Heating aqueous homogeneous reaction mixture comprising fluosilicate, reagent providing hydroxide ions by hydrothermal decomposition, structuring agent; separating precipitate, calcining RHONE-POULENC CHIMIE (FR) 1993-09-21 US disclosed