SCHEMBL5010989

SCHEMBL5010989

OCCCCSSCCO

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.35
LMNA P02545 2/20 0.33
ALDH1A1 P00352 2/20 0.33
TSHR P16473 2/20 0.33
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3679045 0.93 SMN1; SMN2 (0.39) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL5169066 0.93 TDP1 (0.44) TDP1SMN1; SMN2TSHR
SCHEMBL5168567 0.90 TDP1 (0.41) TDP1
SCHEMBL18655487 0.90 LMNA (0.42) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL3676122 0.90 LMNA (0.42) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL3579746 0.90 LMNA (0.42) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL2458373 0.90 LMNA (0.42) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL3723747 0.90 LMNA (0.42) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL7902914 0.90 LMNA (0.42) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL5167230 0.86 TDP1 (0.44) TDP1SMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7429447-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-09-30 US disclosed
US-7429444-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-09-30 US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
US-7264920-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-09-04 US disclosed
US-7250249-B2 Black and white photothermographic material FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed
US-7247421-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-07-24 US disclosed
US-7232652-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-20070082301-A1 Image forming method using photothermographic material FUJI PHOTO FILM CO., LTD. 2007-04-12 US disclosed
US-20070065764-A1 Black and white photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed
US-20070065762-A1 Black and white photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed
US-20050277072-A1 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2005-12-15 US disclosed
US-20050260529-A1 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2005-11-24 US disclosed
EP-1584978-A1 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. (JP) 2005-10-12 EP disclosed
EP-1582918-A1 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. (JP) 2005-10-05 EP disclosed
US-20050214699-A1 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2005-09-29 US disclosed
US-20050214702-A1 Black and white photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2005-09-29 US disclosed
US-20050118542-A1 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2005-06-02 US disclosed
US-20050079457-A1 Photothermographic material and method for preparing photosensitive silver halide emulsion FUJI PHOTO FILM CO., LTD. 2005-04-14 US disclosed
US-20050069827-A1 Photosensitive silver halide emulsion, silver halide photographic photosensitive material, photothermographic material and image-forming method FUJIFILM CORPORATION (JP) 2005-03-31 US disclosed
US-20050026093-A1 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2005-02-03 US disclosed