⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL232898 | 0.70 | — | — | |
| SCHEMBL3135921 | 0.69 | — | — | |
| SCHEMBL9615199 | 0.67 | — | — | |
| SCHEMBL15015774 | 0.67 | — | — | |
| SCHEMBL9562720 | 0.61 | — | — | |
| SCHEMBL21385488 | 0.59 | — | — | |
| SCHEMBL12414928 | 0.59 | — | — | |
| SCHEMBL377532 | 0.59 | — | — | |
| SCHEMBL5916261 | 0.59 | — | — | |
| SCHEMBL35296 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8450218-B2 | Methods of forming silicon oxides and methods of forming interlevel dielectrics | MICRON TECHNOLOGY, INC. (US) | 2013-05-28 | — | — | US | disclosed |
| US-20120100726-A1 | Methods of Forming Silicon Oxides and Methods of Forming Interlevel Dielectrics | MICRON TECHNOLOGY, INC. | 2012-04-26 | — | — | US | disclosed |
| US-8105956-B2 | Methods of forming silicon oxides and methods of forming interlevel dielectrics | MICRON TECHNOLOGY, INC. (US) | 2012-01-31 | — | — | US | disclosed |
| US-20110092061-A1 | Methods of Forming Silicon Oxides and Methods of Forming Interlevel Dielectrics | MICRON TECHNOLOGY, INC. | 2011-04-21 | — | — | US | disclosed |