Lithium Ion

Lithium Ion

SCHEMBL5013311

O=C([O-])C(F)(C(F)(F)F)S(=O)(=O)O.O=C([O-])C(F)(C(F)(F)F)S(=O)(=O)O.[Li+].[Li+]

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lithium Ion SCHEMBL5014270 0.86 ALDH1A1 (0.36) ALDH1A1L3MBTL1
Lithium Ion SCHEMBL15063404 0.74 ALDH1A1 (0.55) ALDH1A1L3MBTL1
SCHEMBL13112893 0.74 ALDH1A1 (0.55) ALDH1A1L3MBTL1
SCHEMBL5013310 0.72 ALDH1A1 (0.52) ALDH1A1L3MBTL1
SCHEMBL11444640 0.72 ALDH1A1 (0.40) ALDH1A1L3MBTL1
Lithium Ion SCHEMBL5013308 0.70 ALDH1A1 (0.39) ALDH1A1L3MBTL1
SCHEMBL593692 0.69 ALDH1A1 (0.55) ALDH1A1L3MBTL1
Trifluoromethanesulfonic Acid SCHEMBL28197311 0.67 ALDH1A1 (0.40) ALDH1A1L3MBTL1
SCHEMBL10212041 0.65 ALDH1A1 (0.50) ALDH1A1L3MBTL1
Trifluoroacetic Acid SCHEMBL104453 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9118062-B2 Anode and method of manufacturing the same, and battery and method of manufacturing the same SONY CORPORATION (JP) 2015-08-25 US disclosed
US-20080311472-A1 ANODE AND METHOD OF MANUFACTURING THE SAME, AND BATTERY AND METHOD OF MANUFACTURING THE SAME SONY CORPORATION (JP) 2008-12-18 US disclosed