SCHEMBL5014928

SCHEMBL5014928

O=C(O)CCNCCNCC(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.42
EGLN1 Q9GZT9 2/20 0.42
ALKBH5 Q6P6C2 1/20 0.42
SUCNR1 Q9BXA5 1/20 0.42
ECE1 P42892 1/20 0.39
SLC22A6 Q4U2R8 1/20 0.38
CA1 P00915 4/20 0.37
CA2 P00918 4/20 0.37
TSHR P16473 1/20 0.36
NFKB1 P19838 1/20 0.36
PMP22 Q01453 1/20 0.36
KDM4E B2RXH2 1/20 0.36
KDM6B O15054 1/20 0.36
KDM5C P41229 1/20 0.36
FOLH1 Q04609 1/20 0.36
PHF8 Q9UPP1 1/20 0.36
KDM2A Q9Y2K7 1/20 0.36
LTA4H P09960 2/20 0.36
PRMT1 Q99873 1/20 0.36
LDHA P00338 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL158810 0.94 LMNA (0.47) LMNAEGLN1ALKBH5SUCNR1ECE1
Hydrochloric Acid SCHEMBL28658324 0.92 LMNA (0.44) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL8186348 0.92 LMNA (0.44) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL18160753 0.91 LMNA (0.41) LMNAEGLN1ALKBH5SUCNR1SLC22A6
SCHEMBL5035377 0.91 LMNA (0.50) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL12491912 0.91 LMNA (0.50) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL17433002 0.91 LMNA (0.50) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL20415450 0.91 LMNA (0.50) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL162041 0.91 LMNA (0.50) LMNAEGLN1ALKBH5SUCNR1ECE1
SCHEMBL1134677 0.91 LMNA (0.41) LMNAEGLN1ALKBH5SUCNR1SLC22A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117917989-A Use of a reversible metal electrodeposited electrolyte with pH-adjustable, dynamic glass element with high opacity and excellent rest stability, and electrolyte useful therefor 代表内华达大学雷诺分校的内华达高等教育系统董事会 2024-04-23 CN disclosed
US-20080115423-A1 Polishing Composition For Silicon Wafer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-05-22 US disclosed