SCHEMBL5016153

SCHEMBL5016153

O[SiH](Cc1ccccc1)O[SiH3]

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.39
CALM1 P0DP23 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
IDO1 P14902 3/20 0.34
THRB P10828 1/20 0.34
CES2 O00748 1/20 0.34
CES1 P23141 1/20 0.34
AKR1B1 P15121 1/20 0.34
ALDH1A1 P00352 3/20 0.33
NOS1 P29475 1/20 0.33
TP53 P04637 1/20 0.33
LOXL2 Q9Y4K0 1/20 0.33
NR4A1 P22736 1/20 0.33
NR4A2 P43354 1/20 0.33
NR4A3 Q92570 1/20 0.33
AGXT P21549 1/20 0.33
TRPA1 O75762 1/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33
PTGS1 P23219 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4355746 0.76 TSHR (0.46) TSHRCALM1TDP1IDO1THRB
SCHEMBL3482200 0.73 TSHR (0.43) TSHRCALM1TDP1IDO1THRB
SCHEMBL7101824 0.73 IDO1 (0.39) TSHRCALM1IDO1LOXL2AGXT
SCHEMBL2510929 0.73 TP53 (0.39) TSHRCALM1TDP1IDO1ALDH1A1
SCHEMBL819896 0.72 TSHR (0.48) TSHRCALM1TDP1IDO1THRB
SCHEMBL3237076 0.72 TSHR (0.48) TSHRCALM1TDP1IDO1THRB
SCHEMBL30447961 0.71 TSHR (0.36) TSHRCALM1TDP1IDO1ALDH1A1
SCHEMBL28455843 0.70 TSHR (0.38) TSHRALDH1A1TP53LMNA
SCHEMBL28455844 0.69 TSHR (0.36) TSHRTRPA1SLC6A2SLC6A3
SCHEMBL15302282 0.69 TSHR (0.43) TSHRCALM1TDP1IDO1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7393911-B2 Organosilicon fine particles and method of producing same TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2008-07-01 US disclosed
US-20060089478-A1 antireflection and antiblocking characteristics to synthetic polymer films and sheets when applied to their surface or caused to be contained, respectively, and adherence and slip characteristics to a skin care cosmetic material when caused to be contained TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2006-04-27 US disclosed