SCHEMBL7101824

SCHEMBL7101824

N[SiH](Cc1ccccc1)O[SiH3]

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 3/20 0.39
EPHX1 P07099 1/20 0.39
LOXL2 Q9Y4K0 2/20 0.39
AGXT P21549 1/20 0.38
TSHR P16473 1/20 0.37
TAAR1 Q96RJ0 4/20 0.37
SLC6A2 P23975 3/20 0.37
CYP2A6 P11509 2/20 0.37
MAOA P21397 1/20 0.37
SLC6A4 P31645 1/20 0.37
SLC6A3 Q01959 1/20 0.37
SIGMAR1 Q99720 1/20 0.37
ADORA2A P29274 1/20 0.37
ADORA1 P30542 1/20 0.37
CALM1 P0DP23 1/20 0.36
HTR2A P28223 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ANPEP P15144 1/20 0.34
CYP2D6 P10635 1/20 0.34
SRR Q9GZT4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4355746 0.76 TSHR (0.46) IDO1LOXL2AGXTTSHRCALM1
SCHEMBL25364772 0.73 LOXL2 (0.43) IDO1EPHX1LOXL2AGXTTSHR
SCHEMBL5016153 0.73 TSHR (0.39) IDO1LOXL2AGXTTSHRSLC6A2
SCHEMBL2510929 0.73 TP53 (0.39) IDO1LOXL2AGXTTSHRTAAR1
SCHEMBL30447961 0.71 TSHR (0.36) IDO1LOXL2AGXTTSHRTAAR1
SCHEMBL28209612 0.69 CALM1 (0.48) IDO1EPHX1LOXL2AGXTTSHR
SCHEMBL16684673 0.68 KDM4E (0.39) TSHRTAAR1SIGMAR1CALM1CYP2D6
SCHEMBL305086 0.68 TSHR (0.33) IDO1LOXL2AGXTTSHRCALM1
SCHEMBL8380375 0.67 CALM1 (0.45) IDO1LOXL2TSHRTAAR1CYP2A6
SCHEMBL8830313 0.67 LTA4H (0.38) IDO1LOXL2AGXTTSHRCALM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109963963-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2019-07-02 CN claimed
EP-2742109-B1 CURABLE CYCLIC ANHYDRIDE COPOLYMER/SILICONE COMPOSITION 3M INNOVATIVE PROPERTIES CO (US) 2015-09-09 EP disclosed
EP-2742109-A1 CURABLE CYCLIC ANHYDRIDE COPOLYMER/SILICONE COMPOSITION 3M Innovative Properties Company (US) 2014-06-18 EP disclosed
US-8653190-B2 Curable cyclic anhydride copolymer/silicone composition 3M INNOVATIVE PROPERTIES COMPANY (US) 2014-02-18 US disclosed
US-20130041084-A1 CURABLE CYCLIC ANHYDRIDE COPOLYMER/SILICONE COMPOSITION 3M INNOVATIVE PROPERTIES COMPANY 2013-02-14 US disclosed
WO-2013022511-A1 CURABLE CYCLIC ANHYDRIDE COPOLYMER/SILICONE COMPOSITION 3M INNOVATIVE PROPERTIES COMPANY (US) 2013-02-14 WO disclosed
EP-0822952-B1 POLYDIORGANOSILOXANE OLIGOUREA SEGMENTED COPOLYMERS AND A PROCESS FOR MAKING SAME MINNESOTA MINING & MFG (US) 2003-07-23 EP disclosed
US-6441118-B2 COPOLYMER CONTAINS SOFT POLYDIORGANOSILOXANE UITS, HARD DIISOCYANATE RESIDUE SEGEMNT, BOTH SEGMENTS ARE CONNECTED BY UREA LINKAGES AND TERMINAL GROUPS THAT ARE NONREACTIVE, REACTIVE UNDER FREE RADICAL OR CURING CONDIATIONS OR AMINES 3M INNOVATIVE PROPERTIES COMPANY 2002-08-27 US disclosed
US-20010037008-A1 POLYDIORGANOSILOXANE OLIGOUREA SEGMENTED COPOLYMERS AND A PROCESS FOR MAKING SAME 3M INNOVATIVE PROPERTIES COMPANY 2001-11-01 US disclosed
EP-0822952-A1 POLYDIORGANOSILOXANE OLIGOUREA SEGMENTED COPOLYMERS AND A PROCESS FOR MAKING SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-02-11 EP disclosed
WO-1997040103-A1 SILICONE COMPOSITIONS CONTAINING A SILICONE-UREA SEGMENTED COPOLYMER MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-10-30 WO disclosed
WO-1996034030-A1 POLYDIORGANOSILOXANE OLIGOUREA SEGMENTED COPOLYMERS AND A PROCESS FOR MAKING SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-10-31 WO disclosed