Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 4/20 | 0.65 |
| ▸ | CNR2 | P34972 | 3/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.65 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.65 |
| ▸ | DRD3 | P35462 | 1/20 | 0.64 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.58 |
| ▸ | MAPT | P10636 | 1/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.58 |
| ▸ | ATM | Q13315 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL501399 | 0.88 | HRH3 (0.69) | ALDH1A1HRH3DRD3KDM4ELMNA | |
| SCHEMBL501604 | 0.87 | HRH3 (0.67) | ALDH1A1HRH3DRD3KDM4ELMNA | |
| Hydrochloric Acid SCHEMBL8642143 | 0.86 | KMT2A (0.68) | ALDH1A1HRH3DRD3KDM4ELMNA | |
| SCHEMBL24178214 | 0.84 | ALDH1A1 (0.55) | CNR1CNR2ALDH1A1HRH3DRD3 | |
| SCHEMBL12550718 | 0.84 | HRH3 (0.67) | CNR1CNR2ALDH1A1HRH3DRD3 | |
| SCHEMBL11338527 | 0.83 | ALDH1A1 (0.69) | ALDH1A1KDM4ESMN1; SMN2ATMLMNA | |
| SCHEMBL24178222 | 0.82 | ATM (0.55) | CNR1CNR2ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL21705259 | 0.82 | ALDH1A1 (0.67) | ALDH1A1SMN1; SMN2ATMLMNAKMT2A | |
| SCHEMBL31006164 | 0.82 | ALDH1A1 (0.67) | ALDH1A1KDM4ESMN1; SMN2ATMLMNA | |
| SCHEMBL30259591 | 0.81 | CNR1 (0.69) | CNR1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20220004101-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |
| US-10792489-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10734132-B2 | Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-04 | — | — | US | disclosed |
| US-10695554-B2 | Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-20180223133-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| US-20180223133-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-7459261-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-7459261-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-20080032231-A1 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. | 2008-02-07 | — | — | US | disclosed |
| US-20080032231-A1 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. | 2008-02-07 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-7255973-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-14 | — | — | US | disclosed |
| US-7255973-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-14 | — | — | US | disclosed |
| US-20050106500-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-05-19 | — | — | US | disclosed |