SCHEMBL5019490

SCHEMBL5019490

CC/C(C)=N/OC(=O)NCCCCCCNC(=O)O/N=C(\C)CC

nearest known ligand 0.48

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 3/20 0.48
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
FAAH O00519 1/20 0.44
ABHD16A O95870 1/20 0.44
PLA2G7 Q13093 1/20 0.44
NCEH1 Q6PIU2 1/20 0.44
DAGLB Q8NCG7 1/20 0.44
DAGLA Q9Y4D2 1/20 0.44
KDM4E B2RXH2 1/20 0.43
MAPK1 P28482 1/20 0.43
HIF1A Q16665 1/20 0.43
ACHE P22303 7/20 0.42
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15386861 1.00 EPHX1 (0.48) EPHX1MEN1KMT2AFAAHABHD16A
SCHEMBL25129204 1.00 EPHX1 (0.48) EPHX1MEN1KMT2AFAAHABHD16A
SCHEMBL11873194 0.95 EPHX1 (0.58) EPHX1FAAHACHE
SCHEMBL16381789 0.95 EPHX1 (0.58) EPHX1FAAHACHE
SCHEMBL24977100 0.95 EPHX1 (0.58) EPHX1FAAHACHE
SCHEMBL19734493 0.95 EPHX1 (0.58) EPHX1FAAHACHE
SCHEMBL25806146 0.88 ACHE (0.37) EPHX1MEN1KMT2AFAAHABHD16A
SCHEMBL15386839 0.87 EPHX1 (0.38) EPHX1MEN1KMT2AFAAHABHD16A
SCHEMBL18680536 0.87 EPHX1 (0.38) EPHX1MEN1KMT2AFAAHABHD16A
SCHEMBL15386830 0.85 FAAH (0.38) EPHX1MEN1KMT2AFAAHABHD16A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230295368-A1 CATALYST FOR DISSOCIATION OF BLOCKING AGENT FOR BLOCKED ISOCYANATES, AND THERMOSETTING COMPOSITION CONTAINING SAID CATALYST FOR DISSOCIATION OF BLOCKING AGENT KOEI CHEMICAL COMPANY, LIMITED (JP) 2023-09-21 US disclosed
US-11718704-B2 Catalyst for dissociation of blocking agent for blocked isocyanates, and thermosetting composition containing said catalyst for dissociation of blocking agent KOEI CHEMICAL COMPANY, LIMITED (JP) 2023-08-08 US disclosed
US-20200216600-A1 CATALYST FOR DISSOCIATION OF BLOCKING AGENT FOR BLOCKED ISOCYANATES, AND THERMOSETTING COMPOSITION CONTAINING SAID CATALYST FOR DISSOCIATION OF BLOCKING AGENT KOEI CHEMICAL COMPANY, LIMITED (JP) 2020-07-09 US disclosed
WO-2019065953-A1 CATALYST FOR DISSOCIATION OF BLOCKING AGENT FOR BLOCKED ISOCYANATES, AND THERMOSETTING COMPOSITION CONTAINING SAID CATALYST FOR DISSOCIATION OF BLOCKING AGENT 広栄化学工業株式会社 2019-04-04 WO disclosed
US-9761741-B2 Film-forming material NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-09-12 US disclosed
US-8828651-B2 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-8828651-B2 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-8623745-B2 Composition for forming gate insulating film for thin-film transistor NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-01-07 US disclosed
US-8623745-B2 Composition for forming gate insulating film for thin-film transistor NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-01-07 US disclosed
US-20130284262-A1 FILM-FORMING MATERIAL NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-10-31 US disclosed
US-8168371-B2 Positive photosensitive resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-05-01 US disclosed
US-8168371-B2 Positive photosensitive resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-05-01 US disclosed
US-20110318907-A1 COMPOSITION FOR FORMING GATE INSULATING FILM FOR THIN-FILM TRANSISTOR NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-12-29 US disclosed
US-20110318907-A1 COMPOSITION FOR FORMING GATE INSULATING FILM FOR THIN-FILM TRANSISTOR NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-12-29 US disclosed
US-20100028805-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-02-04 US disclosed
US-20100028805-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-02-04 US disclosed
EP-2109001-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2009-10-14 EP disclosed
US-20070020559-A1 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-01-25 US disclosed
US-20070020559-A1 Positive-type photosensitive resin composition and cured film manufactured therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-01-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230295368-A1 CATALYST FOR DISSOCIATION OF BLOCKING AGENT FOR BLOCKED ISOCYANATES, AND THERMOSETTING COMPOSITION CONTAINING SAID CATALYST FOR DISSOCIATION OF BLOCKING AGENT IDH3A, RCOR1, MUS81 EPHX1 2822/4885MEN1 176/4885KMT2A 236/4885
US-11718704-B2 Catalyst for dissociation of blocking agent for blocked isocyanates, and thermosetting composition containing said catalyst for dissociation of blocking agent IDH3A, RCOR1, MUS81 EPHX1 2822/4885MEN1 176/4885KMT2A 236/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.