Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.66 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.66 |
| ▸ | MEN1 | O00255 | 4/20 | 0.66 |
| ▸ | RAB9A | P51151 | 3/20 | 0.66 |
| ▸ | TP53 | P04637 | 2/20 | 0.66 |
| ▸ | GAA | P10253 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.54 |
| ▸ | TOP1 | P11387 | 2/20 | 0.51 |
| ▸ | TERT | O14746 | 1/20 | 0.51 |
| ▸ | HDAC1 | Q13547 | 3/20 | 0.50 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | F10 | P00742 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | TOP2A | P11388 | 1/20 | 0.49 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6029925 | 0.88 | NPC1 (0.82) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL16404286 | 0.86 | NPC1 (0.70) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL15782665 | 0.84 | PARP1 (0.51) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL3661213 | 0.82 | NPC1 (0.74) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL1470784 | 0.82 | NPC1 (0.73) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL4946074 | 0.82 | NPC1 (0.73) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL8349162 | 0.82 | HDAC1 (0.70) | HDAC1HDAC3 | |
| SCHEMBL15782663 | 0.81 | IDO1 (0.51) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL308111 | 0.81 | NPC1 (0.72) | NPC1KMT2AMEN1RAB9ATP53 | |
| SCHEMBL14030915 | 0.80 | MAPT (0.50) | KMT2AMEN1RAB9AGAALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11573491-B2 | Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-02-07 | — | — | US | disclosed |
| EP-3779596-A1 | NEGATIVE-TYPE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2021-02-17 | — | — | EP | disclosed |
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |