Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | LCK | P06239 | 1/20 | 0.32 |
| ▸ | FYN | P06241 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3414053 | 1.00 | PTGS1 (0.34) | PTGS1AKR1C3ALDH1A1TSHRFFAR3 | |
| SCHEMBL5134574 | 0.83 | PTGS1 (0.34) | PTGS1AKR1C3FFAR3LCKFYN | |
| SCHEMBL3739902 | 0.79 | LMNA (0.33) | PTGS1AKR1C3 | |
| SCHEMBL28517978 | 0.77 | — | — | |
| SCHEMBL1865885 | 0.77 | PTGS1 (0.37) | PTGS1AKR1C3ALDH1A1TSHRFFAR3 | |
| SCHEMBL1865884 | 0.77 | PTGS1 (0.37) | PTGS1AKR1C3ALDH1A1TSHRFFAR3 | |
| SCHEMBL30864320 | 0.76 | LMNA (0.35) | ALDH1A1TSHR | |
| SCHEMBL7482039 | 0.75 | PTGS1 (0.30) | PTGS1AKR1C3 | |
| SCHEMBL5591839 | 0.75 | ALDH1A1 (0.42) | PTGS1AKR1C3ALDH1A1TSHR | |
| SCHEMBL28201801 | 0.75 | PTGS1 (0.30) | PTGS1AKR1C3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3411427-B1 | MECHANOCHEMICAL RESISTANT INTRAMOLECULAR CROSSLINKED POLYMERS AND USES THEREOF | TECHNION RES & DEV FOUNDATION (IL) | 2021-10-06 | — | — | EP | claimed |
| CN-110691818-A | Polymer, thermochromic and/or hydrogel compositions and devices, including products embodying same, and methods and processes for making same | 上海创始实业（集团）有限公司 | 2020-01-14 | — | — | CN | disclosed |
| CN-109782540-A | The forming method of photoetching agent pattern | 台湾积体电路制造股份有限公司 | 2019-05-21 | — | — | CN | disclosed |
| CN-109782553-A | Photoresist developer | 台湾积体电路制造股份有限公司 | 2019-05-21 | — | — | CN | disclosed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| WO-2015132734-A1 | 3D PRINTED NAILS | MOYAL DANIEL (IL) | 2015-09-11 | — | — | WO | disclosed |
| US-20140147794-A1 | METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2014-05-29 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-20060223008-A1 | Composition for forming antireflection film, laminate, and method for forming resist pattern | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| EP-1703327-A2 | Composition for forming antireflection film, laminate, and method for forming resist pattern | JSR Corporation (JP) | 2006-09-20 | — | — | EP | disclosed |
| US-6455033-B1 | ANTIMICROBIAL COMPOSITION; POLYMERIZABLE ACRYLIC MONOMERS; POLYMERIZATION CATALYSTS; | MYCONE DENTAL CORP. | 2002-09-24 | — | — | US | disclosed |
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | disclosed |
| US-5410005-A | Comprising acrylic amide and ester copolymers and their salts, having carboxyl and sulfonic acid groups as well as fluoro | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-04-25 | — | — | US | disclosed |
| EP-0583918-A2 | Reflection preventing film and process for forming resist pattern using the same | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-02-23 | — | — | EP | disclosed |