Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.41 |
| ▸ | RXRA | P19793 | 1/20 | 0.41 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.41 |
| ▸ | RXRB | P28702 | 1/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.41 |
| ▸ | RXRG | P48443 | 1/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.31 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.31 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4165010 | 1.00 | ALDH1A1 (0.41) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL2219955 | 0.96 | ALDH1A1 (0.41) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL10813263 | 0.85 | ALDH1A1 (0.39) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL15673307 | 0.82 | EPHX1 (0.38) | EPHX1CA1CA2CA4TAS1R3 | |
| SCHEMBL2979621 | 0.80 | ALDH1A1 (0.39) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL6824530 | 0.80 | ALDH1A1 (0.39) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL7029721 | 0.78 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL6075918 | 0.78 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL7029719 | 0.78 | ALDH1A1 (0.33) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL17420399 | 0.78 | ALDH1A1 (0.35) | ALDH1A1GABRA1TSHRGABRG2RXRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9239518-B2 | Photosensitive resin composition and method of forming pattern using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-01-19 | — | — | US | claimed |
| EP-2404940-B1 | Method for producing polymer composition and polymer composition | INCTEC INC (JP) | 2014-12-24 | — | — | EP | claimed |
| US-20140234776-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-08-21 | — | — | US | claimed |
| US-20140212809-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-07-31 | — | — | US | claimed |
| US-20140135413-A1 | PHOTO-CURABLE ORGANIC-INORGANIC HYBRID RESIN COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2014-05-15 | — | — | US | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-20070184293-A1 | RESIN COMPOSITION FOR ORGANIC INSULATING LAYER, METHOD OF MANUFACTURING RESIN COMPOSITION, AND DISPLAY PANEL INCLUDING RESIN COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-09 | — | — | US | claimed |
| US-7101650-B2 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-09-05 | — | — | US | claimed |
| EP-1244755-B1 | PRESSURE SENSITIVE ADHESIVE AND BIOMEDICAL ELECTRODES USING SAME | 3M INNOVATIVE PROPERTIES CO (US) | 2006-01-18 | — | — | EP | claimed |
| US-20050042536-A1 | Photosensitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO. LTD. (KR) | 2005-02-24 | — | — | US | claimed |
| US-20040248030-A1 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-12-09 | — | — | US | claimed |
| WO-2003036388-A1 | PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-05-01 | — | — | WO | claimed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | claimed |
| EP-0835294-B1 | LIGHT DIFFUSING ADHESIVE | MINNESOTA MINING & MFG (US) | 2003-01-29 | — | — | EP | claimed |
| US-11988962-B2 | Colored photosensitive resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-05-21 | — | — | US | disclosed |
| US-20240134233-A1 | BARRIER RIB FOR IMAGE DISPLAY DEVICE, MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE COMPRISING BARRIER RIB | DONGWOO FINE-CHEM CO., LTD. (KR) | 2024-04-25 | — | — | US | disclosed |
| EP-0190993-A2 | Perfluoroalkylsulfonoalkyl acrylates and methacrylates, process for their preparation and their use | CIBA-GEIGY AG (CH) | 1986-08-13 | — | — | EP | disclosed |
| EP-0181281-A1 | Fluoroalkylcarbamyl acrylates and methacrylates | CIBA-GEIGY AG (CH) | 1986-05-14 | — | — | EP | disclosed |
| EP-0177447-A1 | Diperfluoroalkyl carbamyl acrylates and methacrylates | CIBA-GEIGY AG (CH) | 1986-04-09 | — | — | EP | disclosed |