Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Salicylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.86 |
| ▸ | HPGD | P15428 | 6/20 | 0.86 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.86 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.56 |
| ▸ | CA1 | P00915 | 2/20 | 0.56 |
| ▸ | CA9 | Q16790 | 2/20 | 0.56 |
| ▸ | CA12 | O43570 | 1/20 | 0.56 |
| ▸ | CA2 | P00918 | 1/20 | 0.56 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.56 |
| ▸ | CA4 | P22748 | 1/20 | 0.56 |
| ▸ | CA6 | P23280 | 1/20 | 0.56 |
| ▸ | CA7 | P43166 | 1/20 | 0.56 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.56 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.54 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | MPO | P05164 | 1/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Salicylic Acid SCHEMBL27610516 | 0.98 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL106485 | 0.98 | KDM4E (0.91) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL7160601 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL30602285 | 0.95 | KDM4E (0.95) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL6844323 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL28460576 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL17135351 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL3783480 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL22588845 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 | |
| Salicylic Acid SCHEMBL503706 | 0.95 | KDM4E (0.86) | KDM4EHPGDALDH1A1SMN1; SMN2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11502203-B2 | Coating liquid for forming metal oxide film, oxide film, field-effect transistor, and method for producing the same | RICOH COMPANY, LTD. (JP) | 2022-11-15 | — | — | US | disclosed |
| US-20200075768-A1 | COATING LIQUID FOR FORMING METAL OXIDE FILM, OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME | RICOH COMPANY, LTD. (JP) | 2020-03-05 | — | — | US | disclosed |
| EP-3602615-A1 | COATING LIQUID FOR FORMING METAL OXIDE FILM, OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME | Ricoh Company, Ltd. (JP) | 2020-02-05 | — | — | EP | disclosed |
| CN-102414876-B | Electrode plate for non-aqueous electrolyte secondary battery, method for producing electrode plate for non-aqueous electrolyte secondary battery, and non-aqueous electrolyte secondary battery | DAINIPPON PRINTING CO LTD | 2014-06-18 | — | — | CN | disclosed |
| CN-102414878-B | Electrode plate for nonaqueous electrolyte secondary battery, method for producing electrode plate for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery | DAINIPPON PRINTING CO LTD | 2014-06-18 | — | — | CN | disclosed |
| US-8394537-B2 | Electrode plate for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8394538-B2 | Electrode plate for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8394535-B2 | Electrode plate for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8394536-B2 | Electrode plate for non-aqueous electrolyte secondary battery, method for producing the same, and non-aqueous electrolyte secondary battery | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| CN-101667493-B | Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same | DAINIPPON PRINTING CO LTD | 2012-09-26 | — | — | CN | disclosed |
| CN-101061062-A | Method for producing metal oxide film | DAINIPPON PRINTING CO LTD (JP) | 2007-10-24 | — | — | CN | disclosed |
| CN-101056716-A | Method for producing metal oxide film | DAINIPPON PRINTING CO LTD (JP) | 2007-10-17 | — | — | CN | disclosed |
| US-20060219294-A1 | Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same | DAI NIPPON PRINTING CO., LTD. | 2006-10-05 | — | — | US | disclosed |
| CN-1841786-A | Oxide semiconductor electrode, dye-sensitized solar cell, and method for producing same | DAINIPPON PRINTING CO LTD (JP) | 2006-10-04 | — | — | CN | disclosed |
| US-20050183769-A1 | Method of producing substrate for dye-sensitized solar cell and dye-sensitized solar cell | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| US-20020037478-A1 | Fluorescent pattern, process for preparing the same, organic alkali developing solution for forming the same, emulsion developing solution for forming the same and back plate for plasma display using the same | KIMURA NAOKI (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6358663-B2 | CALCINATION PRODUCT OF PHOSPHOR PATTERN PRECURSOR CONTAINING AN ORGANIC MATERIAL CONTAINING AT LEAST ONE SELECTED FROM THE GROUP CONSISTING OF ALKALI METAL, ALKALINE EARTH METAL, PHOSPHOR | HITACHI CHEMICAL CO., LTD. (JP) | 2002-03-19 | — | — | US | disclosed |
| US-20010002302-A1 | Fluorescent pattern, process for preparing the same, organic alkali developing solution for forming the same, emulsion developing solution for forming the same and back plate for plasma display using the same | KIMURA NAOKI (JP) | 2001-05-31 | — | — | US | disclosed |
| US-6232024-B1 | PHOSPHOR PATTERN | HITACHI CHEMICAL CO., LTD. (JP) | 2001-05-15 | — | — | US | disclosed |
| EP-0872870-A2 | Fluorescent pattern, process for preparing the same, organic alkali developing solution for forming the same, emulsion developing solution for forming the same and back plate for plasma display using the same | Hitachi Chemical Co., Ltd. (JP) | 1998-10-21 | — | — | EP | disclosed |