Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 1/20 | 0.40 |
| ▸ | CNR2 | P34972 | 2/20 | 0.33 |
| ▸ | CDC25A | P30304 | 6/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | CDC45 | O75419 | 2/20 | 0.32 |
| ▸ | ATP1A1 | P05023 | 1/20 | 0.32 |
| ▸ | ATP1B1 | P05026 | 1/20 | 0.32 |
| ▸ | ATP1A3 | P13637 | 1/20 | 0.32 |
| ▸ | ATP1B2 | P14415 | 1/20 | 0.32 |
| ▸ | ATP1A2 | P50993 | 1/20 | 0.32 |
| ▸ | ATP1B3 | P54709 | 1/20 | 0.32 |
| ▸ | FXYD2 | P54710 | 1/20 | 0.32 |
| ▸ | ATP1A4 | Q13733 | 1/20 | 0.32 |
| ▸ | PTPRC | P08575 | 1/20 | 0.32 |
| ▸ | POLA1 | P09884 | 1/20 | 0.30 |
| ▸ | TOP2A | P11388 | 1/20 | 0.30 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL638375 | 1.00 | DPP4 (0.40) | DPP4CNR2CDC25AHSD11B1PTPN1 | |
| SCHEMBL1285599 | 1.00 | DPP4 (0.40) | DPP4CNR2CDC25AHSD11B1PTPN1 | |
| SCHEMBL6907574 | 0.78 | CNR2 (0.36) | DPP4CNR2 | |
| SCHEMBL6907572 | 0.78 | CNR2 (0.36) | DPP4CNR2 | |
| SCHEMBL637619 | 0.73 | ALDH1A1 (0.30) | — | |
| SCHEMBL10406290 | 0.72 | CNR2 (0.36) | CNR2 | |
| SCHEMBL6568487 | 0.71 | ALDH1A1 (0.38) | DPP4 | |
| SCHEMBL5407267 | 0.69 | CNR2 (0.36) | DPP4CNR2 | |
| SCHEMBL1668635 | 0.69 | CNR2 (0.36) | DPP4CNR2 | |
| SCHEMBL29761172 | 0.69 | CNR2 (0.36) | DPP4CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140147794-A1 | METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2014-05-29 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120171613-A1 | UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |