Zinc Ion

Zinc Ion

SCHEMBL504276

[In+3].[N-3].[N-3].[N-3].[Zn+2].[Zn+2].[Zn+2]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Zinc Ion SCHEMBL516897 0.87
Zinc Ion SCHEMBL516973 0.87
Zinc Ion SCHEMBL319919 0.87
Zinc Ion SCHEMBL139850 0.82
Zinc Ion SCHEMBL29437696 0.82
SCHEMBL50218 0.82
Zinc Ion SCHEMBL504004 0.78
SCHEMBL721061 0.67
SCHEMBL517543 0.67
SCHEMBL7162309 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9129888-B2 Nitride-based semiconductor device and manufacturing method thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-09-08 US claimed
US-20140021481-A1 NITRIDE-BASED SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-01-23 US claimed
CN-110494992-B Semiconductor device and light emitting device package including the same 苏州立琻半导体有限公司 2022-11-01 CN disclosed
CN-107667254-B Lighting module LG 伊诺特有限公司 2020-09-29 CN disclosed
US-9985173-B2 II-III-N semiconductor nanoparticles and method of making same SHARP KABUSHIKI KAISHA (JP) 2018-05-29 US disclosed
US-20170373195-A1 TRANSISTOR AND SEMICONDUCTOR DEVICE SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 2017-12-28 US disclosed
US-20170373192-A1 TRANSISTOR AND SEMICONDUCTOR DEVICE SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 2017-12-28 US disclosed
US-9129888-B2 Nitride-based semiconductor device and manufacturing method thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-09-08 US disclosed
US-8900489-B2 II-III-N semiconductor nanoparticles and method of making same SHARP KABUSHIKI KAISHA (JP) 2014-12-02 US disclosed
US-20140021481-A1 NITRIDE-BASED SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-01-23 US disclosed
US-20120025139-A1 II-III-V COMPOUND SEMICONDUCTOR SHARP KABUSHIKI KAISHA (JP) 2012-02-02 US disclosed
US-20120025146-A1 II-III-N SEMICONDUCTOR NANOPARTICLES AND METHOD OF MAKING SAME SHARP KABUSHIKI KAISHA (JP) 2012-02-02 US disclosed