SCHEMBL505289

SCHEMBL505289

O=C(O)c1ccccc1S(=O)(=O)c1ccccc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 3/20 0.58
MMP9 P14780 3/20 0.58
MMP8 P22894 3/20 0.58
MMP13 P45452 3/20 0.58
MMP1 P03956 2/20 0.58
CA1 P00915 1/20 0.58
CA2 P00918 1/20 0.58
MMP3 P08254 2/20 0.56
MMP12 P39900 2/20 0.56
MMP14 P50281 2/20 0.56
MMP16 P51512 2/20 0.56
TSHR P16473 2/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
HTR6 P50406 4/20 0.53
F2 P00734 2/20 0.53
PRSS1 P07477 2/20 0.53
PRSS2 P07478 2/20 0.53
PRSS3 P35030 2/20 0.53
NPSR1 Q6W5P4 1/20 0.53
ALDH1A1 P00352 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30444901 0.89 CA1 (0.64) MMP2MMP9MMP8MMP13MMP1
SCHEMBL11348903 0.89 CA1 (0.64) MMP2MMP9MMP8MMP13MMP1
SCHEMBL989207 0.89 CA1 (0.64) MMP2MMP9MMP8MMP13MMP1
SCHEMBL7191147 0.89 POLB (0.58) MMP2MMP9MMP8MMP13MMP1
SCHEMBL29046725 0.87 MMP2 (0.56) MMP2MMP9MMP8MMP13MMP1
SCHEMBL13908249 0.87 MMP2 (0.53) MMP2MMP9MMP8MMP13MMP1
SCHEMBL5134479 0.87 MMP2 (0.53) MMP2MMP9MMP8MMP13MMP1
SCHEMBL9134117 0.87 CA1 (0.62) MMP2MMP9MMP8MMP13MMP1
SCHEMBL9132788 0.87 CA1 (0.62) MMP2MMP9MMP8MMP13MMP1
SCHEMBL9133026 0.87 CA1 (0.62) MMP2MMP9MMP8MMP13MMP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 215 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119505168-A TPU antistatic master batch formula and method 惠州市振有新材料科技有限公司 2025-02-25 CN claimed
WO-2024101868-A1 BINDER COMPRISING POLYAMIDE POLYMER, POSITIVE ELECTRODE FOR SECONDARY BATTERY COMPRISING BINDER, AND SECONDARY BATTERY COMPRISING POSITIVE ELECTRODE 주식회사 한솔케미칼 2024-05-16 WO claimed
WO-2024091011-A1 BINDER COMPRISING POLYAMIDE POLYMER, POSITIVE ELECTRODE FOR SECONDARY BATTERY COMPRISING BINDER, AND SECONDARY BATTERY COMPRISING POSITIVE ELECTRODE 주식회사 한솔케미칼 2024-05-02 WO claimed
CN-110437113-B Synthesis method of 4-benzenesulfonylbenzoic acid 苏州华道生物药业股份有限公司 2021-02-09 CN claimed
EP-0415422-A2 Method for forming images FUJI PHOTO FILM CO., LTD. (JP) 1991-03-06 EP claimed
CN-119505168-A TPU antistatic master batch formula and method 惠州市振有新材料科技有限公司 2025-02-25 CN disclosed
CN-118185254-A Polyester film, protective film and preparation method thereof 爱思开迈克沃有限公司 2024-06-14 CN disclosed
WO-2024122368-A1 EASILY-ADHESIVE POLYESTER FILM 東洋紡株式会社 2024-06-13 WO disclosed
CN-115308821-B Polyester film for protecting polarizer 东洋纺株式会社 2024-05-24 CN disclosed
WO-2024019353-A1 MULTILAYER SHEET AND MULTILAYER ELECTRONIC DEVICE 에스케이마이크로웍스솔루션즈 주식회사 2024-01-25 WO disclosed
CN-113518811-B Easy-to-adhere polyester film 东洋纺株式会社 2024-01-02 CN disclosed
CN-117227295-A Multilayer sheet and multilayer electronic device including the same 爱思开迈克沃解决方案有限公司 2023-12-15 CN disclosed
US-5157097-A Reacting aromatic tricarboxylic acids, diisocyanates, diamines and end-blocking compounds; high glass transition temperature, heat resistant, melt moldable MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1992-10-20 US disclosed
US-5102705-A Stretching polyethylene naphthalenedicarboxylate; gas barrier, heat resistance, transparency MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1992-04-07 US disclosed
EP-0472421-A2 Polyamide-imide resins and process of producing them MITSUI TOATSU CHEMICALS, Inc. (JP) 1992-02-26 EP disclosed
WO-1991018891-A1 AROMATIC PYRROLIDINE AND THIAZOLIDINE AMIDES PFIZER INC. (US) 1991-12-12 WO disclosed
EP-0415728-A2 Process for preparing blow molded articles MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1991-03-06 EP disclosed
EP-0383324-A1 Bottle and method for making thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-08-22 EP disclosed
US-4183976-A Process of producing a magnetic recording element FUJI PHOTO FILM CO., LTD. (JP) 1980-01-15 US disclosed
US-4064108-A THERMAL STABILITY, CHEMICAL RESISTANCE TEIJIN LIMITED (JA) 1977-12-20 US disclosed