SCHEMBL5058624

SCHEMBL5058624

CCCCC(CCCC)(C(C)=O)C(=O)OC(C)=O.[SnH4]

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
ATM Q13315 2/20 0.35
NAAA Q02083 1/20 0.34
TSHR P16473 4/20 0.33
CES2 O00748 2/20 0.33
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
HPGD P15428 1/20 0.33
GAA P10253 1/20 0.32
HCAR2 Q8TDS4 2/20 0.32
DGKA P23743 1/20 0.31
FDPS P14324 1/20 0.31
CES1 P23141 1/20 0.30
THRB P10828 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27820110 0.98 ALDH1A1 (0.39) ALDH1A1ATMNAAATSHRCES2
SCHEMBL27641295 0.96 ALDH1A1 (0.38) ALDH1A1ATMNAAATSHRMEN1
SCHEMBL27641297 0.89 MEN1 (0.41) ALDH1A1ATMNAAACES2MEN1
SCHEMBL1261012 0.81 ALDH1A1 (0.52) ALDH1A1ATMNAAATSHRMEN1
SCHEMBL13606393 0.80 ATM (0.39) ALDH1A1ATMTSHRCES2MEN1
SCHEMBL8986781 0.79 ALDH1A1 (0.50) ALDH1A1ATMNAAATSHRMEN1
SCHEMBL27729126 0.79 ALDH1A1 (0.36) ALDH1A1TSHRGAA
SCHEMBL17617195 0.79 MEN1 (0.43) ALDH1A1ATMNAAATSHRMEN1
SCHEMBL17617178 0.79 MEN1 (0.43) ALDH1A1ATMNAAATSHRMEN1
SCHEMBL28616759 0.78 FDPS (0.35) ALDH1A1ATMTSHRCES2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1031385-A2 Chemically adsorbed film, method of manufacturing the same, and chemical absorption solution used for the same Matsushita Electric Industrial Co., Ltd. (JP) 2000-08-30 EP claimed
EP-0826430-A2 Chemically adsorbed film, method of manufacturing the same, and chemical adsorption solution used for the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-03-04 EP claimed
WO-2021215186-A1 COMPOSITION CONTAINING ORGANOPOLYSILOXANE, PRODUCTION METHOD THEREFOR, COATING MATERIAL, AND COATED ARTICLE 信越化学工業株式会社 (JP) 2021-10-28 WO disclosed
WO-2021149376-A1 ALKOXYSILYL GROUP-CONTAINING PERFLUOROPOLYETHER COMPOUND, AND COMPOSITION CONTAINING SAME 信越化学工業株式会社 2021-07-29 WO disclosed
EP-1797967-B1 METHOD FOR ORGANIC THIN FILM FORMATION NIPPON SODA CO (JP) 2017-09-13 EP disclosed
US-8568836-B2 Organic thin film forming method, auxiliary agent for forming an organic thin film, and solution for forming an organic thin film NIPPON SODA CO., LTD. (JP) 2013-10-29 US disclosed
US-20080213494-A1 Organic Thin Film Forming Method, Auxiliary Agent For Forming an Organic Thin Film, and Solution For Forming and Organic Thin Film NIPPON SODA CO., LTD. (JP) 2008-09-04 US disclosed
EP-1797967-A1 METHOD FOR ORGANIC THIN FILM FORMATION, ASSISTANT FOR ORGANIC THIN FILM FORMATION, AND SOLUTION FOR ORGANIC THIN FILM FORMATION NIPPON SODA CO., LTD. (JP) 2007-06-20 EP disclosed
US-7067563-B2 Binding agents and binding agent compositions containing alkoxy silyl groups, methods of production and use HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2006-06-27 US disclosed
US-20040048998-A1 Binding agents and binding agent compositions containing alkoxy silyl groups, method for the production and use thereof HENKEL AG & CO. KGAA (DE) 2004-03-11 US disclosed
EP-0748659-B1 Finishing agents and methods of using the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2003-05-14 EP disclosed
EP-1221469-A2 Finishing agents and method of using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 2002-07-10 EP disclosed
US-6287633-B1 USING MIXTURE OF ALKOXYSILANE SURFACTANT AND ACID CATALYST MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2001-09-11 US disclosed
EP-1031385-A2 Chemically adsorbed film, method of manufacturing the same, and chemical absorption solution used for the same Matsushita Electric Industrial Co., Ltd. (JP) 2000-08-30 EP disclosed
US-6063438-A APPLYING ALKOXYSILANE AND CATALYST MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2000-05-16 US disclosed
US-6013331-A PROVIDED BY ADDING THE SAME TYPE OF A SILANE CROSSLINKING AGENT AS A CHEMICAL ADSORBENT IN A CHEMICAL ADSORPTION SOLUTION IN FILM-FORMING PROCESSES, AND THEN BY CROSSLINKING ADSORBED MOLECULES MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2000-01-11 US disclosed
US-5998541-A MIXTURE OF SURFACTANT, CATALYST AND NONAQUEOUS SOLVENT MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1999-12-07 US disclosed
US-5770640-A Finishing agents and method of using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-06-23 US disclosed
EP-0826430-A2 Chemically adsorbed film, method of manufacturing the same, and chemical adsorption solution used for the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-03-04 EP disclosed
EP-0748659-A2 Finishing agents and methods of using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) 1996-12-18 EP disclosed