SCHEMBL5078766

SCHEMBL5078766

O=C=C(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28396130 0.67
SCHEMBL5150790 0.64 CA2 (0.30)
SCHEMBL7736467 0.61
SCHEMBL20972840 0.61
SCHEMBL7733914 0.61
SCHEMBL7723856 0.61
SCHEMBL8031309 0.61
Trifluoroacetic Acid SCHEMBL28204040 0.61 ALDH1A1 (0.38)
SCHEMBL8845415 0.59
Carbon Dioxide SCHEMBL3993612 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230407003-A1 FLUORINE-CONTAINING ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, METHOD FOR PRODUCING ARTICLE, AND COMPOUND AGC Inc. (JP) 2023-12-21 US disclosed
WO-2022186269-A1 FLUORINE-CONTAINING ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, METHOD FOR PRODUCING ARTICLE, AND COMPOUND AGC株式会社 2022-09-09 WO disclosed
US-20080274334-A1 Dry Etching Gas and Method of Dry Etching NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-11-06 US disclosed
EP-1760769-A1 DRY ETCHING GASES AND METHOD OF DRY ETCHING National Institute of Advanced Industrial Science and Technology (JP) 2007-03-07 EP disclosed
US-4357282-A CONTACTING A FLUORINATED METHYL OR ETHYL EHTER HAVING A METHOXYLATED CARBON ATOM WITH A LEWIS ACID CATALYST ACYLATION E. I. DU PONT DE NEMOURS AND COMPANY (US) 1982-11-02 US disclosed
US-4001319-A FROM TRIFLUOROACETYL FLUORIDE AND SULFUR TRIOXIDE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-01-04 US disclosed