⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5077499 | 0.81 | — | — | |
| SCHEMBL5075439 | 0.77 | — | — | |
| SCHEMBL333168 | 0.73 | — | — | |
| SCHEMBL5081324 | 0.69 | ALDH1A1 (0.32) | — | |
| SCHEMBL3834726 | 0.69 | — | — | |
| SCHEMBL5081319 | 0.61 | — | — | |
| SCHEMBL1482242 | 0.60 | — | — | |
| SCHEMBL274532 | 0.58 | — | — | |
| SCHEMBL9755516 | 0.58 | — | — | |
| SCHEMBL3074175 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080274334-A1 | Dry Etching Gas and Method of Dry Etching | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-11-06 | — | — | US | disclosed |
| EP-1760769-A1 | DRY ETCHING GASES AND METHOD OF DRY ETCHING | National Institute of Advanced Industrial Science and Technology (JP) | 2007-03-07 | — | — | EP | disclosed |