SCHEMBL5079689

SCHEMBL5079689

CCCC[C]F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL481198 0.90
SCHEMBL624994 0.77
SCHEMBL3633669 0.73
SCHEMBL101677 0.71
SCHEMBL8672344 0.69 TSHR (0.53)
SCHEMBL55033 0.69 TSHR (0.53)
SCHEMBL216495 0.69
SCHEMBL3156663 0.67
SCHEMBL11854278 0.67 TSHR (0.50)
SCHEMBL443292 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109563243-B Fluorine atom-containing polymer and use thereof 日产化学株式会社 2022-07-08 CN disclosed
EP-3168250-B1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF NISSAN CHEMICAL CORP (JP) 2020-02-26 EP disclosed
US-10199578-B2 Fluorine-atom-containing polymer and use thereof NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-02-05 US disclosed
US-20170200897-A1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-07-13 US disclosed
US-9671692-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
EP-3168250-A1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF Nissan Chemical Industries, Ltd. (JP) 2017-05-17 EP disclosed
EP-3124466-A1 TRIARYLAMINE DERIVATIVE AND USE OF SAME Nissan Chemical Industries, Ltd. (JP) 2017-02-01 EP disclosed
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-25 US disclosed
US-20150064622-A1 COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-03-05 US disclosed
US-20080290049-A1 Methods for Separating Slurry Components EXXONMOBIL CHEMICAL PATENTS INC. 2008-11-27 US disclosed
EP-1758942-A1 METHODS FOR SEPARATING SLURRY COMPONENTS ExxonMobil Chemical Patents Inc. (US) 2007-03-07 EP disclosed
WO-2006009550-A1 METHODS FOR SEPARARING SLURRY COMPONENTS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2006-01-26 WO disclosed
US-5400211-A Packaged electrical component THE EVANS FINDINGS COMPANY, INC. (US) 1995-03-21 US disclosed
US-4992910-A Double layer capacitor THE EVANS FINDINGS COMPANY, INC. (US) 1991-02-12 US disclosed