SCHEMBL5085409

SCHEMBL5085409

COC(=O)Nc1cc(NC(=O)OC)c(Nc2ccccc2)cc1Nc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.53
MAPT P10636 8/20 0.53
ALOX15 P16050 1/20 0.53
AKR1C3 P42330 2/20 0.50
AKR1C2 P52895 2/20 0.50
HTT P42858 4/20 0.49
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
LMNA P02545 3/20 0.47
GAA P10253 3/20 0.47
MAPK1 P28482 5/20 0.46
HSD17B10 Q99714 2/20 0.46
ALOX12 P18054 2/20 0.46
POLB P06746 1/20 0.46
ALDH1A1 P00352 4/20 0.45
CASP3 P42574 2/20 0.45
SENP7 Q9BQF6 2/20 0.45
CYP3A4 P08684 2/20 0.45
FAAH O00519 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5085272 1.00 HPGD (0.53) HPGDMAPTALOX15AKR1C3AKR1C2
SCHEMBL9479630 0.84 MAPT (0.56) HPGDMAPTALOX15HTTMEN1
SCHEMBL5078720 0.81 MAPT (0.63) HPGDMAPTALOX15AKR1C3AKR1C2
SCHEMBL5081832 0.81 MAPT (0.63) HPGDMAPTALOX15AKR1C3AKR1C2
SCHEMBL5085327 0.80 HPGD (0.68) HPGDMAPTALOX15HTTMEN1
SCHEMBL9479507 0.79 HPGD (0.68) HPGDMAPTHTTMEN1KMT2A
SCHEMBL282531 0.78 SMN1; SMN2 (0.71) HPGDMAPTHTTKMT2ASMN1; SMN2
SCHEMBL9480583 0.77 MAPT (0.69) HPGDMAPTHTTMEN1KMT2A
SCHEMBL11661335 0.77 HPGD (0.60) HPGDALOX15HTTMEN1KMT2A
SCHEMBL8884482 0.77 SMN1; SMN2 (0.69) HPGDMAPTHTTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1462471-B1 Dielectric films and materials therefor DAICEL CHEM (JP) 2008-07-30 EP disclosed
US-20070078256-A1 Prepolymers, prepolymer compositions, high-molecular-weight polymers with pore structure, and dielectric films DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-05 US disclosed
US-20070078256-A1 Prepolymers, prepolymer compositions, high-molecular-weight polymers with pore structure, and dielectric films DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-05 US disclosed
US-20070078256-A1 Prepolymers, prepolymer compositions, high-molecular-weight polymers with pore structure, and dielectric films DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-05 US disclosed
US-7186454-B2 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
US-7186454-B2 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
US-7186454-B2 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
EP-1683822-A1 PREPOLYMER, PREPOLYMER COMPOSITION, HIGH MOLECULAR WEIGHT POLYMER HAVING STRUCTURE CONTAINING HOLE AND ELECTRICALLY INSULATING FILM Daicel Chemical Industries, Ltd. (JP) 2006-07-26 EP disclosed
EP-1462471-A1 Dielectric films and materials thereof Daicel Chemical Industries, Ltd. (JP) 2004-09-29 EP disclosed
US-20040175858-A1 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-09 US disclosed