Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.40 |
| ▸ | CHRM1 known ✓ | P11229 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 1.00 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 1.00 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 1.00 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.58 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.58 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | TP53 | P04637 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.47 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.43 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2548 | 1.00 | ALDH1A1 (1.00) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL4556431 | 1.00 | ALDH1A1 (1.00) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL4819900 | 0.97 | ALDH1A1 (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL11449213 | 0.97 | KDM4E (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL10608060 | 0.97 | ALDH1A1 (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL10608057 | 0.97 | ALDH1A1 (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL309119 | 0.97 | ALDH1A1 (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL4821241 | 0.97 | ALDH1A1 (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Hydrochloric Acid SCHEMBL5086759 | 0.97 | KDM4E (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 | |
| Ammonia Solution, Strong SCHEMBL28310887 | 0.97 | ALDH1A1 (0.95) | ALDH1A1KDM4ETDP1CHRNB2CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107665990-B | Chloride battery positive plate and preparation method thereof | 横店集团东磁股份有限公司 | 2021-02-26 | — | — | CN | disclosed |
| CN-107785178-B | Chloride capacitor positive plate and preparation method thereof | 横店集团东磁股份有限公司 | 2020-09-29 | — | — | CN | disclosed |
| CN-107785176-B | Chloride capacitor positive electrode slurry and preparation method thereof | 横店集团东磁股份有限公司 | 2020-09-29 | — | — | CN | disclosed |
| CN-107785536-B | Chloride square battery and assembling method thereof | 横店集团东磁股份有限公司 | 2020-08-14 | — | — | CN | disclosed |
| CN-107785573-B | Chloride soft package battery and assembling method thereof | 横店集团东磁股份有限公司 | 2020-07-17 | — | — | CN | disclosed |
| CN-107799727-B | Chloride cylindrical battery and assembling method thereof | 横店集团东磁股份有限公司 | 2020-07-17 | — | — | CN | disclosed |
| US-7387812-B2 | Telechelic polymers; improved adhesion properties, chemical stability, electrical properties and resistance to rapid temperature ranges; for use as solder resists in production of circuit boards | HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) | 2008-06-17 | — | — | US | disclosed |
| EP-1458794-B1 | HEAT-CURABLE RESIN COMPOSITION | HUNTSMAN ADV MAT SWITZERLAND (CH) | 2005-08-17 | — | — | EP | disclosed |
| US-20050032935-A1 | Telechelic polymers; improved adhesion properties, chemical stability, electrical properties and resistance to rapid temperature ranges; for use as solder resists in production of circuit boards | HUNTSMAN ADVANCED MATERIALS AMERICAS, INC. | 2005-02-10 | — | — | US | disclosed |
| EP-1458794-A1 | HEAT-CURABLE RESIN COMPOSITION | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2004-09-22 | — | — | EP | disclosed |
| EP-1092741-B1 | POLYESTER AND PROCESS FOR PRODUCING THE SAME | COSMO RES INST (JP) | 2003-09-10 | — | — | EP | disclosed |
| WO-2003048235-A1 | HEAT-CURABLE RESIN COMPOSITION | VANTICO AG (CH) | 2003-06-12 | — | — | WO | disclosed |
| US-6303745-B1 | FROM THE POLYCONDENSATION OF A 2H-PYRAN-2-ONE-4,6-DICARBOXYLIC ACID OR DERIVATIVE AND A GLYCOL | COSMO RESEARCH INSTITUTE (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1092741-A1 | POLYESTER AND PROCESS FOR PRODUCING THE SAME | Cosmo Research Institute (JP) | 2001-04-18 | — | — | EP | disclosed |