Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRR1 | P24046 | 2/20 | 0.43 |
| ▸ | GGT1 | P19440 | 1/20 | 0.40 |
| ▸ | PAOX | Q6QHF9 | 3/20 | 0.34 |
| ▸ | CPB2 | Q96IY4 | 4/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | LCK | P06239 | 1/20 | 0.32 |
| ▸ | FYN | P06241 | 1/20 | 0.32 |
| ▸ | CPB1 | P15086 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL8775545 | 1.00 | GABRR1 (0.43) | GABRR1GGT1PAOXCPB2TP53 | |
| Acetic Acid SCHEMBL10524376 | 0.98 | GABRR1 (0.41) | GABRR1GGT1PAOXCPB2TP53 | |
| Acetic Acid SCHEMBL29012712 | 0.98 | GABRR1 (0.41) | GABRR1GGT1PAOXCPB2TP53 | |
| Acetic Acid SCHEMBL29259484 | 0.96 | GABRR1 (0.40) | GABRR1GGT1PAOXCPB2CPB1 | |
| Carbamic Acid SCHEMBL28243838 | 0.91 | GABRR1 (0.43) | GABRR1GGT1PAOXCPB2TP53 | |
| Acetic Acid SCHEMBL8775556 | 0.89 | GABRR1 (0.35) | GABRR1GGT1CPB2 | |
| SCHEMBL27099 | 0.88 | — | — | |
| Acetic Acid SCHEMBL28385152 | 0.87 | CA1 (0.38) | GABRR1GGT1PAOXCPB2 | |
| SCHEMBL28852761 | 0.85 | — | — | |
| Acetic Acid SCHEMBL3841808 | 0.85 | FFAR3 (0.39) | TP53FFAR3LCKFYNALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116457447-A | POST chemical mechanical polishing (POST CMP) cleaning compositions | 恩特格里斯公司 | 2023-07-18 | — | — | CN | claimed |
| CN-108221041-B | Method for electropolishing metal substrates | 空中客车防务和空间有限责任公司 | 2021-06-04 | — | — | CN | claimed |
| US-20190048292-A1 | Processing Composition of Improved Metal Interconnect Protection and The Use Thereof | WU JIALI (US) | 2019-02-14 | — | — | US | claimed |
| CN-103764878-B | Acierage on zinc surface | 汉高股份有限及两合公司 | 2016-06-15 | — | — | CN | claimed |
| CN-105101937-A | Multi-component encapsulated reactive formulations | PIBED LTD | 2015-11-25 | — | — | CN | claimed |
| CN-103764878-A | Electrolytic freezing of zinc surfaces | HENKEL AG & CO KGAA | 2014-04-30 | — | — | CN | claimed |
| CN-101928521-A | Slurry composition and method for manufacturing damascene structure using the same | MENGZHI TECHNOLOGY CO LTD | 2010-12-29 | — | — | CN | claimed |
| US-20060094637-A1 | Deruster composition and method | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) | 2006-05-04 | — | — | US | claimed |
| EP-1652969-A1 | Deruster composition and method | Henkel Kommanditgesellschaft auf Aktien (DE) | 2006-05-03 | — | — | EP | claimed |
| EP-0616979-A2 | Method for solubilizing silica | ROHM AND HAAS COMPANY (US) | 1994-09-28 | — | — | EP | claimed |
| US-5342787-A | Diluting to expected detectable silica level adding chelate at basic ph | ROHM AND HAAS COMPANY (US) | 1994-08-30 | — | — | US | claimed |
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | FUJIFILM CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12374540-B2 | Post-CMP semiconductor cleaning composition comprising an amine/alkanolamine mixture | FUJIFILM CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-12247300-B2 | Cleaning solution and cleaning method | FUJIFILM CORPORATION (JP) | 2025-03-11 | — | — | US | disclosed |
| CN-118284682-A | Laundry treatment box | 宝洁公司 | 2024-07-02 | — | — | CN | disclosed |
| EP-0616979-A2 | Method for solubilizing silica | ROHM AND HAAS COMPANY (US) | 1994-09-28 | — | — | EP | disclosed |
| US-5342787-A | Diluting to expected detectable silica level adding chelate at basic ph | ROHM AND HAAS COMPANY (US) | 1994-08-30 | — | — | US | disclosed |
| US-5191008-A | Process for the production of latexes by the selective monomer addition | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1993-03-02 | — | — | US | disclosed |
| US-4383859-A | CONCENTRATED FORM SUBJECTED TO STRESS FOR PARTICLE FORMATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1983-05-17 | — | — | US | disclosed |
| EP-0065617-A1 | A method of making ink for ink jet devices | International Business Machines Corporation (US) | 1982-12-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | SSRP1, H1-5, AOC1 | GABRR1 1063/4885GGT1 1435/4885PAOX 2358/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.