SCHEMBL510702

SCHEMBL510702

CC[Si](CC)(CC)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15360806 0.80
SCHEMBL2270973 0.79
SCHEMBL11852845 0.78
SCHEMBL15360386 0.78
SCHEMBL11662753 0.76
SCHEMBL11852835 0.76
SCHEMBL15309891 0.75
SCHEMBL2266296 0.75 DNM1 (0.32)
SCHEMBL9137684 0.73
SCHEMBL22116200 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 455 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 US claimed
CN-119463887-B Composite saline-alkali soil conditioner and preparation method thereof 上海师范大学 2025-06-24 CN claimed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN claimed
CN-119463887-A Composite saline-alkali soil conditioner and preparation method thereof 上海师范大学 2025-02-18 CN claimed
WO-2024228843-A1 PLASMA PRETREATMENT FOR SELECTIVE ADSORPTION OF AMINOSILANE INHIBITOR LAM RESEARCH CORPORATION (US) 2024-11-07 WO claimed
CN-111886676-B Method for treating surface of wafer and composition therefor 中央硝子株式会社 2024-09-27 CN claimed
US-20230420256-A1 METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING SAME ASM IP HOLDING B.V. (NL) 2023-12-28 US claimed
US-11735422-B2 Method of forming a photoresist underlayer and structure including same ASM IP HOLDING B.V. (NL) 2023-08-22 US claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
US-11649547-B2 Deposition of carbon doped silicon oxide VERSUM MATERIALS US, LLC (US) 2023-05-16 US claimed
EP-1436018-A1 NITRIC OXIDE-RELEASING COATED MEDICAL DEVICES AND METHOD OF PREPARING SAME THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 2004-07-14 EP claimed
WO-2003026717-A1 NITRIC OXIDE-RELEASING COATED MEDICAL DEVICES AND METHOD OF PREPARING SAME THE GOVERNMENT OF THE UNITED STATES OF AMERICA, REPRESENTED BY THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 2003-04-03 WO claimed
EP-0671483-B1 Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors ENICHEM SPA (IT) 1997-12-29 EP claimed
US-5663398-A Processes for preparing functionalized alkyllithium compounds FMC CORPORATION (US) 1997-09-02 US claimed
EP-0540084-B1 Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons ENICHEM SPA (IT) 1996-09-04 EP claimed
EP-0671483-A1 Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors ENICHEM S.p.A. (IT) 1995-09-13 EP claimed
US-5424095-A Decomposing organosilicon precursor inside chemical reactor to form film of ceramic material on surface; prevents coking ENIRICERCHE S.P.A. (IT) 1995-06-13 US claimed
EP-0540084-A1 Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons ENICHEM S.p.A. (IT) 1993-05-05 EP claimed
US-5208069-A Silane precursor ISTITUTO GUIDO DONEGANI S.P.A. (IT) 1993-05-04 US claimed
US-4770963-A Humidity insensitive photoresponsive imaging members XEROX CORPORATION (US) 1988-09-13 US claimed