SCHEMBL51157

SCHEMBL51157

COCC(COC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10028008 0.90 PRKD3 (0.41) —
SCHEMBL13225891 0.90 PRKD3 (0.41) —
SCHEMBL820179 0.90 PRKD3 (0.41) —
SCHEMBL19257466 0.86 CYP2C9 (0.32) —
SCHEMBL13136933 0.85 PRKD3 (0.31) —
Ether SCHEMBL15671753 0.85 ALDH1A1 (0.39) —
SCHEMBL210480 0.83 — —
SCHEMBL6041979 0.83 — —
SCHEMBL14904900 0.83 — —
SCHEMBL5719 0.83 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 570 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120149586-A Wide-potential window electrolyte for water-based lithium ion battery, and preparation method and application thereof 北京理工大学前沿技术研究院 2025-06-13 — — CN claimed
EP-4313934-B1 INDUSTRIAL SYNTHESIS OF SERINOL BRACCO IMAGING SPA (IT) 2025-05-07 — — EP claimed
CN-119868572-A Charge-guided cartilage targeted micro-nano delivery system and preparation method and application thereof 青岛大学附属医院 2025-04-25 — — CN claimed
CN-119775545-A Water-soluble polyester resin, plasma etching protection liquid containing same, and preparation method and application thereof 深圳市化讯半导体材料有限公司 2025-04-08 — — CN claimed
WO-2025021165-A1 POLYMER COMPRISING ESTER-IMIDE STRUCTURAL UNIT, AND PREPARATION METHOD THEREFOR 西湖大学 2025-01-30 — — WO claimed
CN-118109089-B Polyolefin emulsion and preparation method and application thereof 拓迪化学(上海)股份有限公司 2024-09-20 — — CN claimed
CN-118271608-A Water-soluble polyamide resin, high-temperature-resistant chip plasma cutting protection liquid, and preparation method and application thereof 浙江奥首材料科技有限公司 2024-07-02 — — CN claimed
US-20240199530-A1 INDUSTRIAL SYNTHESIS OF SERINOL BRACCO IMAGING S.P.A. (IT) 2024-06-20 — — US claimed
CN-118109089-A Polyolefin emulsion and preparation method and application thereof 拓迪化学(上海)股份有限公司 2024-05-31 — — CN claimed
CN-117778068-A Preparation method of mixed grease and preparation method of biodiesel 中国石油化工股份有限公司 2024-03-29 — — CN claimed
US-7655057-B2 Contains polyamideether copolymers and abrasive grains; oxygen demand; for treating wastewater FUJIMI INCORPORATED (JP) 2010-02-02 — — US claimed
CN-100448538-C Distillate hydrogenation catalyst and its preparation method CHINA PETROLEUM & CHEMICAL (CN) 2009-01-07 — — CN claimed
CN-100340338-C Hydrotreatment catalyst and its preparation method CHINA PETROLEUM & CHEMICAL (CN) 2007-10-03 — — CN claimed
US-7211121-B2 Polishing composition FUJIMI INCORPORATED (JP) 2007-05-01 — — US claimed
EP-1760099-A2 Polishing composition and polishing method FUJIMI INCORPORATED (JP) 2007-03-07 — — EP claimed
CN-1923935-A Polishing composition and polishing method FUJIMI INC (JP) 2007-03-07 — — CN claimed
US-20070044385-A1 Contains polyamideether copolymers and abrasive grains; oxygen demand; for treating wastewater FUJIMI INCORPORATED (JP) 2007-03-01 — — US claimed
EP-1471124-B1 Polishing composition FUJIMI INC (JP) 2006-11-08 — — EP claimed
EP-0998912-B1 Use of peracids for hand's disinfection or decontamination BODE CHEMIE GMBH & CO (DE) 2004-10-20 — — EP claimed
US-4559147-A FLUORESCENT MICROSCOPY; A BENZYL GLYCEROL-1,2-CARBONATE DERIVATIVE HOFFMANN-LA ROCHE INC. (US) 1985-12-17 — — US claimed
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