SCHEMBL5118096

SCHEMBL5118096

C=C1OC2(OC1=O)C1CC3CC(C1)CC2C3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18815082 0.86 ALOX12 (0.30)
SCHEMBL18814832 0.86 ALOX12 (0.30)
SCHEMBL14572625 0.74
SCHEMBL14021449 0.72
SCHEMBL8321738 0.72 TSHR (0.33)
SCHEMBL18788896 0.72
SCHEMBL18815083 0.69
SCHEMBL5117003 0.67 HSD11B1 (0.33)
SCHEMBL14444794 0.67 EGFR (0.33)
SCHEMBL5118672 0.64 HSD11B1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed