SCHEMBL5122647

SCHEMBL5122647

CCCCS(=O)(=O)ONCCN

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 12/20 0.36
CA1 P00915 9/20 0.36
RELA Q04206 4/20 0.36
CA12 O43570 2/20 0.34
CA7 P43166 2/20 0.34
CA14 Q9ULX7 2/20 0.34
NPC1 O15118 1/20 0.32
S1PR2 O95136 1/20 0.32
S1PR4 O95977 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
TP53 P04637 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
XBP1 P17861 1/20 0.32
S1PR1 P21453 1/20 0.32
MAPK1 P28482 1/20 0.32
AGTR1 P30556 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28358088 0.93 RELA (0.44) CA2CA1RELAALDH1A1CA9
SCHEMBL28252884 0.88 RELA (0.31) CA2CA1RELA
SCHEMBL28350531 0.88 RELA (0.31) CA2CA1RELA
SCHEMBL28591828 0.86 RELA (0.33) RELA
SCHEMBL6703674 0.86 RELA (0.45) CA2CA1RELACA12CA7
SCHEMBL28325410 0.86 CA1 (0.43) CA2CA1CA12CA7CA14
SCHEMBL29272027 0.81 LMNA (0.35) ALDH1A1LMNAHPGD
SCHEMBL10893748 0.81
SCHEMBL2117012 0.81
SCHEMBL28601140 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112831268-B Photo-curing water-based paint resin and preparation method thereof 万华化学集团股份有限公司 2022-07-12 CN claimed
CN-113121987-A Water-based 3D printing material and preparation method and application thereof 李立 2021-07-16 CN claimed
CN-112831268-A Photo-curing water-based paint resin and preparation method thereof 万华化学集团股份有限公司 2021-05-25 CN claimed
CN-108159886-A Reverse osmosis membrane scale inhibition preparation 净沃(厦门)环保科技有限公司 2018-06-15 CN claimed
CN-101560022-B Compound corrosion and scale inhibitor XI AN XIELI POWER TECHNOLOGY CO LTD 2011-05-11 CN claimed
CN-101560022-A Compound corrosion and scale inhibitor XI AN XIELI POWER TECHNOLOGY C (CN) 2009-10-21 CN claimed
CN-112794967-B Radiation-curable water-based resin and preparation method and application thereof 万华化学集团股份有限公司 2022-11-25 CN disclosed
CN-114765986-A Acid and alkali resistant composition 科思创知识产权两合公司 2022-07-19 CN disclosed
CN-112831268-B Photo-curing water-based paint resin and preparation method thereof 万华化学集团股份有限公司 2022-07-12 CN disclosed
CN-114729099-A Aqueous polyurethane dispersions 科思创知识产权两合公司 2022-07-08 CN disclosed
CN-111378270-B Composition for forming foam, method for producing foam, and material for leather 日华化学株式会社 2022-05-06 CN disclosed
CN-113121987-A Water-based 3D printing material and preparation method and application thereof 李立 2021-07-16 CN disclosed
CN-112831268-A Photo-curing water-based paint resin and preparation method thereof 万华化学集团股份有限公司 2021-05-25 CN disclosed
CN-111378270-A Composition for forming foam, method for producing foam, and material for leather 日华化学株式会社 2020-07-07 CN disclosed
CN-110997863-A Coated particles, methods of making and using the same as proppants 科思创有限公司 2020-04-10 CN disclosed
CN-108159886-A Reverse osmosis membrane scale inhibition preparation 净沃(厦门)环保科技有限公司 2018-06-15 CN disclosed
CN-101560022-B Compound corrosion and scale inhibitor XI AN XIELI POWER TECHNOLOGY CO LTD 2011-05-11 CN disclosed
CN-101560022-A Compound corrosion and scale inhibitor XI AN XIELI POWER TECHNOLOGY C (CN) 2009-10-21 CN disclosed
US-7345110-B2 Process for the continuous production of an aqueous polyurethane dispersion BAYER MATERIALSCIENCE AG (DE) 2008-03-18 US disclosed
US-20050234190-A1 Process for the continuous production of an aqueous polyurethane dispersion COVESTRO DEUTSCHLAND AG (DE) 2005-10-20 US disclosed