Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.30 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.30 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.30 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.30 |
| ▸ | LDHA | P00338 | 1/20 | 0.30 |
| ▸ | SRR | Q9GZT4 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.30 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.30 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14518486 | 0.89 | FFAR3 (0.32) | FFAR3TSHR | |
| SCHEMBL9419778 | 0.80 | — | — | |
| SCHEMBL18231793 | 0.78 | — | — | |
| SCHEMBL16021771 | 0.75 | AKR1B1 (0.34) | TSHR | |
| SCHEMBL527377 | 0.74 | TSHR (0.33) | FFAR3TSHRLMNA | |
| SCHEMBL17230164 | 0.73 | — | — | |
| SCHEMBL513566 | 0.72 | TSHR (0.41) | FFAR3TSHRHDAC3HDAC1HDAC2 | |
| SCHEMBL29065871 | 0.71 | FFAR3 (0.41) | FFAR3TSHRHDAC3HDAC1HDAC2 | |
| SCHEMBL632284 | 0.71 | FFAR3 (0.41) | FFAR3TSHRHDAC3HDAC1HDAC2 | |
| Hydrochloric Acid SCHEMBL11148349 | 0.70 | TSHR (0.39) | FFAR3TSHRHDAC3HDAC1HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2598589-B1 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2019-05-22 | — | — | EP | disclosed |
| US-9040641-B2 | Polycarbonate-polysiloxane copolymer, and method for preparing same | CHEIL INDUSTRIES INC. (KR) | 2015-05-26 | — | — | US | disclosed |
| US-8852848-B2 | Composition for coating over a photoresist pattern | Z Electronic Materials USA Corp. (US) | 2014-10-07 | — | — | US | disclosed |
| US-20130289224-A1 | Polycarbonate-Polysiloxane Copolymer, and Method for Preparing Same | LOTTE ADVANCED MATERIALS CO., LTD. (KR) | 2013-10-31 | — | — | US | disclosed |
| US-8420291-B2 | Positive photosensitive resin composition, method for forming pattern, electronic component | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2013-04-16 | — | — | US | disclosed |
| US-20120028195-A1 | Composition for Coating over a Photoresist Pattern | MERCK PATENT GMBH (DE) | 2012-02-02 | — | — | US | disclosed |
| US-20100258336-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, ELECTRONIC COMPONENT | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2010-10-14 | — | — | US | disclosed |
| US-7205373-B2 | Enzyme catalyzed organosilicon esters and amides | DOW CORNING CORPORATION (US) | 2007-04-17 | — | — | US | disclosed |
| US-20070021578-A1 | Enzyme catalyzed organosilicon esters and amides | BRANDSTADT KURT F | 2007-01-25 | — | — | US | disclosed |