SCHEMBL513000

SCHEMBL513000

CC[Si](CC)(CCC(=O)O)O[Si](CC)(CC)CCC(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.42
HDAC3 O15379 1/20 0.42
HDAC1 Q13547 1/20 0.42
HDAC2 Q92769 1/20 0.42
HDAC8 Q9BY41 1/20 0.42
AKR1B1 P15121 1/20 0.37
LMNA P02545 2/20 0.36
ALKBH5 Q6P6C2 1/20 0.36
SUCNR1 Q9BXA5 1/20 0.36
EGLN1 Q9GZT9 1/20 0.36
GPR84 Q9NQS5 7/20 0.36
PPARG P37231 7/20 0.36
PPARD Q03181 7/20 0.36
PPARA Q07869 7/20 0.36
HDAC11 Q96DB2 5/20 0.36
TSHR P16473 5/20 0.36
PTPN1 P18031 3/20 0.36
ALDH1A1 P00352 2/20 0.36
TLR2 O60603 2/20 0.36
TDP1 Q9NUW8 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL526781 0.93 FFAR3 (0.40) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL514623 0.86 AKR1B1 (0.44) AKR1B1LMNAGPR84PPARGPPARD
SCHEMBL526790 0.80 AKR1B1 (0.43) AKR1B1LMNAGPR84PPARGPPARD
SCHEMBL512768 0.75 FFAR3 (0.38) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL527825 0.73 FFAR3 (0.36) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL8559186 0.72 FFAR3 (0.48) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL513566 0.70 TSHR (0.41) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL31571283 0.70 AKR1B1 (0.41) AKR1B1LMNAGPR84PPARGPPARD
SCHEMBL28774577 0.70 FFAR3 (0.40) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL31571281 0.69 ALDH1A1 (0.48) AKR1B1LMNAGPR84PPARGPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2598589-B1 A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN MERCK PATENT GMBH (DE) 2019-05-22 EP disclosed
US-8852848-B2 Composition for coating over a photoresist pattern Z Electronic Materials USA Corp. (US) 2014-10-07 US disclosed
US-20120028195-A1 Composition for Coating over a Photoresist Pattern MERCK PATENT GMBH (DE) 2012-02-02 US disclosed