Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | CASP1 | P29466 | 1/20 | 0.30 |
| ▸ | CASP7 | P55210 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3165567 | 0.91 | CYP19A1 (0.37) | CYP19A1 | |
| SCHEMBL2350191 | 0.83 | TSHR (0.44) | TSHRALDH1A1HPGDHSD17B10 | |
| SCHEMBL4247813 | 0.82 | TSHR (0.38) | CYP19A1TSHRKDM4EALDH1A1 | |
| SCHEMBL7122610 | 0.81 | MAPK1 (0.39) | CYP19A1 | |
| SCHEMBL601985 | 0.79 | CYP19A1 (0.38) | CYP19A1 | |
| SCHEMBL6262324 | 0.78 | CYP3A4 (0.42) | CYP19A1TSHRKDM4EALDH1A1HPGD | |
| SCHEMBL5419515 | 0.78 | CYP19A1 (0.33) | CYP19A1 | |
| SCHEMBL3763541 | 0.77 | TP53 (0.41) | CYP19A1ALDH1A1 | |
| SCHEMBL7741611 | 0.76 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL3926283 | 0.76 | SLC6A3 (0.40) | CYP19A1TSHRKDM4EALDH1A1GLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7189491-B2 | Photoresist composition for deep UV and process thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-03-13 | — | — | US | claimed |
| EP-1379331-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD. (CH) | 2004-01-14 | — | — | EP | claimed |
| US-6610465-B2 | One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-08-26 | — | — | US | claimed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | claimed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | claimed |
| EP-1815296-B1 | A COMPOSITION FOR COATING OVER A PHTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2020-02-19 | — | — | EP | disclosed |
| EP-2102156-B1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2019-06-26 | — | — | EP | disclosed |
| EP-2598589-B1 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2019-05-22 | — | — | EP | disclosed |
| EP-1566693-B1 | Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| CN-101547895-B | Photoactive compounds | AZ ELECTRONIC MATERIALS USA | 2014-12-03 | — | — | CN | disclosed |
| US-8852848-B2 | Composition for coating over a photoresist pattern | Z Electronic Materials USA Corp. (US) | 2014-10-07 | — | — | US | disclosed |
| EP-2598589-A1 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN | AZ Electronic Materials USA Corp. (US) | 2013-06-05 | — | — | EP | disclosed |
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | MERCK PATENT GMBH (DE) | 2003-12-25 | — | — | US | disclosed |
| US-20030235775-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-25 | — | — | US | disclosed |
| US-6610465-B2 | One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-08-26 | — | — | US | disclosed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | disclosed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | disclosed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | SUN2, UROD, ERCC1 | CYP19A1 3565/4885TSHR 4406/4885KDM4E 2348/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.