SCHEMBL3763541

SCHEMBL3763541

O=C(OCC1CO1)C1=CC2CCC1C2

nearest known ligand 0.43

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.41
CYP3A4 P08684 1/20 0.41
ALDH1A1 P00352 1/20 0.37
MGLL Q99685 6/20 0.36
DHFR P00374 1/20 0.35
CYP19A1 P11511 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7119518 0.86 LMNA (0.47) ALDH1A1
SCHEMBL7122610 0.77 MAPK1 (0.39) CYP19A1
SCHEMBL601985 0.76 CYP19A1 (0.38) CYP19A1
SCHEMBL6262324 0.75 CYP3A4 (0.42) TP53CYP3A4ALDH1A1CYP19A1
SCHEMBL3165567 0.75 CYP19A1 (0.37) CYP19A1
SCHEMBL6422026 0.73 CYP19A1 (0.37) CYP19A1
SCHEMBL4080277 0.73 CYP19A1 (0.38) CYP19A1
SCHEMBL7741611 0.73 CYP19A1 (0.36) CYP19A1
SCHEMBL31064743 0.73 SLC6A3 (0.40) ALDH1A1CYP19A1
SCHEMBL29723645 0.73 SLC6A3 (0.40) ALDH1A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7842441-B2 Norbornene polymer for photoresist and photoresist composition comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-11-30 US disclosed
US-20090075207-A1 NORBORNENE POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION COMPRISING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-03-19 US disclosed