SCHEMBL5131925

SCHEMBL5131925

C=Cc1ccc(/C=N/c2ccccc2O)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 7/20 0.49
KMT2A Q03164 7/20 0.49
MAPT P10636 7/20 0.49
LMNA P02545 6/20 0.49
GAA P10253 5/20 0.49
SMN1; SMN2 Q16637 4/20 0.49
HTT P42858 4/20 0.49
TSHR P16473 2/20 0.49
HSD17B10 Q99714 1/20 0.49
CA12 O43570 1/20 0.48
CA2 P00918 1/20 0.48
CA9 Q16790 1/20 0.48
KDM4E B2RXH2 8/20 0.46
ALDH1A1 P00352 8/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
ATM Q13315 1/20 0.46
POLB P06746 3/20 0.45
NPC1 O15118 2/20 0.45
TP53 P04637 1/20 0.45
MAPK1 P28482 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5131927 1.00 MEN1 (0.49) MEN1KMT2AMAPTLMNAGAA
SCHEMBL14982912 0.90 CA12 (0.57) MEN1KMT2AMAPTLMNAGAA
SCHEMBL4601928 0.85 CA2 (0.52) MEN1KMT2AMAPTLMNAGAA
SCHEMBL29690204 0.85 CA2 (0.52) MEN1KMT2AMAPTLMNAGAA
SCHEMBL4601929 0.85 CA2 (0.52) MEN1KMT2AMAPTLMNAGAA
SCHEMBL14337533 0.84 CA2 (0.55) MEN1KMT2AMAPTLMNAGAA
SCHEMBL2322410 0.84 CA2 (0.55) MEN1KMT2AMAPTLMNAGAA
SCHEMBL1238795 0.84 CA2 (0.55) MEN1KMT2AMAPTLMNAGAA
SCHEMBL30373259 0.84 CA2 (0.55) MEN1KMT2AMAPTLMNAGAA
Lithium Ion SCHEMBL3400785 0.82 CA2 (0.53) MEN1KMT2AMAPTLMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed