SCHEMBL5132064

SCHEMBL5132064

CC(C)c1ccc(C=Nc2ccccc2O)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GRIN2D O15399 2/20 0.46
▸ GRIN3B O60391 2/20 0.46
▸ GRIN1 Q05586 2/20 0.46
▸ GRIN2A Q12879 2/20 0.46
▸ GRIN2B Q13224 2/20 0.46
▸ GRIN2C Q14957 2/20 0.46
▸ GRIN3A Q8TCU5 2/20 0.46
▸ MAPT P10636 5/20 0.45
▸ KMT2A Q03164 5/20 0.45
▸ MEN1 O00255 4/20 0.45
▸ LMNA P02545 3/20 0.45
▸ SMN1; SMN2 Q16637 3/20 0.45
▸ POLB P06746 3/20 0.45
▸ NPC1 O15118 3/20 0.45
▸ RAB9A P51151 3/20 0.45
▸ HTT P42858 2/20 0.45
▸ MAPK1 P28482 2/20 0.45
▸ TP53 P04637 1/20 0.45
▸ MAPK10 P53779 1/20 0.45
▸ GAA P10253 5/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5132061 1.00 GRIN2D (0.46) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL14982912 0.86 CA12 (0.57) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL14030949 0.84 TSHR (0.49) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL14385959 0.81 MAPT (0.49) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL29690204 0.80 CA2 (0.52) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL4601929 0.80 CA2 (0.52) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL4601928 0.80 CA2 (0.52) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL1238795 0.80 CA2 (0.55) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL2322410 0.80 CA2 (0.55) MAPTKMT2AMEN1LMNASMN1; SMN2
SCHEMBL30373259 0.80 CA2 (0.55) MAPTKMT2AMEN1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 — — US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 — — US disclosed
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