SCHEMBL5133394

SCHEMBL5133394

Clc1cccc2c1Cc1ccccc1S2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.46
ALDH1A1 P00352 4/20 0.46
KDM4E B2RXH2 2/20 0.46
L3MBTL1 Q9Y468 1/20 0.45
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
LMNA P02545 2/20 0.38
MAPT P10636 2/20 0.38
HTT P42858 1/20 0.38
ATM Q13315 1/20 0.38
CYP2D6 P10635 2/20 0.38
ADRA2A P08913 1/20 0.38
ADRA2B P18089 1/20 0.38
ADRA2C P18825 1/20 0.38
ADRA1D P25100 1/20 0.38
ADRA1A P35348 1/20 0.38
ADRA1B P35368 1/20 0.38
PNMT P11086 1/20 0.38
NPSR1 Q6W5P4 2/20 0.37
AHR P35869 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL28941926 0.89 HSD17B3 (0.42) HPGDALDH1A1KDM4EL3MBTL1MEN1
SCHEMBL10588135 0.83 ADRA2A (0.41) HPGDALDH1A1KDM4EL3MBTL1LMNA
SCHEMBL31519180 0.79 HPGD (0.44) HPGDALDH1A1KDM4EL3MBTL1MEN1
SCHEMBL5606116 0.79 ALDH1A1 (0.44) HPGDALDH1A1KDM4EL3MBTL1MEN1
SCHEMBL8860333 0.78 HSD17B3 (0.47) HPGDALDH1A1MAPTCYP2D6ADRA2A
SCHEMBL19939674 0.78 HSD17B3 (0.43) HPGDALDH1A1KDM4EL3MBTL1MAPT
SCHEMBL20879826 0.77 ALDH1A1 (0.46) HPGDALDH1A1KDM4EL3MBTL1MEN1
SCHEMBL8890449 0.77 KMT2A (0.53) HPGDALDH1A1KDM4EL3MBTL1MEN1
SCHEMBL8817021 0.77 MEN1 (0.45) HPGDALDH1A1KDM4EL3MBTL1MEN1
SCHEMBL88254 0.77 ALDH1A1 (0.46) HPGDALDH1A1KDM4EL3MBTL1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119875006-A Method for preparing degradable polyacrylamide fracturing fluid through RAFT polymerization method 河北工业大学 2025-04-25 CN claimed
CN-119776014-A Tobacco continuous cropping soil regulator and preparation method thereof 台沃科技集团股份有限公司 2025-04-08 CN claimed
CN-116710083-A Compositions and methods for treating metabolic disorders 反应IP控股有限责任公司 2023-09-05 CN claimed
CN-105820098-B Diaryl sulfide class compound and its synthetic method and application 华东师范大学 2018-08-24 CN claimed
CN-1168652-A Radiation-curable organopolysiloxane release compositions AVERY DENNISON CORP (US) 1997-12-24 CN claimed
CN-122075174-A Oral health dispenser based on oral health detection and image recognition 2026-05-26 CN disclosed
CN-120202186-A 3-Ethylamino-indole dimers as serotonergic agents for the treatment of diseases associated therewith 思维模式制药公司 2025-06-24 CN disclosed
CN-120091999-A 3-Pyrrolidine-indole dimers as serotonergic agents for the treatment of related disorders 思维模式制药公司 2025-06-03 CN disclosed
CN-119875006-A Method for preparing degradable polyacrylamide fracturing fluid through RAFT polymerization method 河北工业大学 2025-04-25 CN disclosed
CN-119786032-A Method for constructing neurodegenerative disease diagnosis model based on soluble TREM2 molecules 重庆医科大学 2025-04-08 CN disclosed
CN-119776014-A Tobacco continuous cropping soil regulator and preparation method thereof 台沃科技集团股份有限公司 2025-04-08 CN disclosed
CN-119546591-A Indoline derivatives as serotonergic agents for the treatment of related disorders 思维模式制药公司 2025-02-28 CN disclosed
US-20070224616-A1 METHOD FOR FORMING MOLECULAR SEQUENCES ON SURFACES NATIONAL INSTITUTES OF HEALTH - DIRECTOR DEITR 2007-09-27 US disclosed
CN-101018819-A Process for producing cured product of photosensitive resin ASAHI CHEMICAL CORP (JP) 2007-08-15 CN disclosed
EP-1170324-B1 SHEET-FORM PHOTOCURABLE MATERIAL DAINIPPON INK & CHEMICALS (JP) 2006-03-08 EP disclosed
US-6974784-B1 Sheet-form photocurable material DAINIPPON INK AND CHEMICALS, INC. (JP) 2005-12-13 US disclosed
US-6596456-B2 High photospeed and resolution, ensure a high durability on the press and also a low tendency to form sludge in the developing processor during developing and which do not require developers with a high content of organic solvents KODAK POLYCHROME GRAPHICS LLC 2003-07-22 US disclosed
US-20030091925-A1 Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates QUALEX INC. 2003-05-15 US disclosed
WO-2002096961-A1 USE OF CINNAMIC ACID GROUPS CONTAINING ACETAL POLYMERS FOR RADIATION-SENSITIVE COMPOSITIONS AND LITHOGRAPHIC PRINTING PLATES KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) 2002-12-05 WO disclosed
EP-1170324-A1 SHEET-FORM PHOTOCURABLE MATERIAL DAINIPPON INK AND CHEMICALS, INC. (JP) 2002-01-09 EP disclosed