SCHEMBL513814

SCHEMBL513814

NCC[SiH2]C1CCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL183520 0.90 SIGMAR1 (0.32)
SCHEMBL9636969 0.86 SIGMAR1 (0.34)
SCHEMBL513144 0.83
SCHEMBL340240 0.81 CA12 (0.34)
SCHEMBL2940414 0.81
SCHEMBL9388510 0.80
SCHEMBL16280362 0.79
SCHEMBL247603 0.79
SCHEMBL5015685 0.79
SCHEMBL5016055 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117247721-A Solvent-free flexible epoxy waterproof material and preparation and construction methods thereof 四川省承华建固防水材料有限公司 2023-12-19 CN claimed
CN-114778628-A Flexible working electrode and enzyme sensor 北京怡成生物电子技术股份有限公司 2022-07-22 CN claimed
US-4152346-A FROM BETA-HALOETHYLSILANES AND AMMONIA, ADHESIVES DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) 1979-05-01 US claimed
CN-119108523-A Modified lithium manganese iron phosphate positive electrode material, preparation method thereof, positive plate and lithium ion battery 合肥国轩高科动力能源有限公司 2024-12-10 CN disclosed
CN-114778628-B Flexible working electrode and enzyme sensor 北京怡成生物电子技术股份有限公司 2024-05-24 CN disclosed
CN-117247721-B Solvent-free flexible epoxy waterproof material and preparation and construction methods thereof 四川省承华建固防水材料有限公司 2024-04-05 CN disclosed
CN-117247721-A Solvent-free flexible epoxy waterproof material and preparation and construction methods thereof 四川省承华建固防水材料有限公司 2023-12-19 CN disclosed
CN-114778628-A Flexible working electrode and enzyme sensor 北京怡成生物电子技术股份有限公司 2022-07-22 CN disclosed
EP-2598589-B1 A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN MERCK PATENT GMBH (DE) 2019-05-22 EP disclosed
US-8852848-B2 Composition for coating over a photoresist pattern Z Electronic Materials USA Corp. (US) 2014-10-07 US disclosed
US-8728455-B2 Radiation-curable antimicrobial coatings BASF SE (DE) 2014-05-20 US disclosed
US-20130196079-A1 RADIATION-CURABLE ANTIMICROBIAL COATING COMPOSITION BASF SE (DE) 2013-08-01 US disclosed
US-20130195793-A1 RADIATION-CURABLE ANTIMICROBIAL COATINGS BASF SE (DE) 2013-08-01 US disclosed
US-20130196075-A1 RADIATION-CURABLE ANTIMICROBIAL COATINGS BASF SE (DE) 2013-08-01 US disclosed
WO-2013110504-A1 RADIATION-CURABLE ANTIMICROBIAL COATINGS BASF SE (DE) 2013-08-01 WO disclosed
EP-2598589-A1 A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN AZ Electronic Materials USA Corp. (US) 2013-06-05 EP disclosed
WO-2012014059-A1 A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN AZ ELECTRONIC MATERIALS USA CORP. (US) 2012-02-02 WO disclosed
US-20120028195-A1 Composition for Coating over a Photoresist Pattern MERCK PATENT GMBH (DE) 2012-02-02 US disclosed
US-4152346-A FROM BETA-HALOETHYLSILANES AND AMMONIA, ADHESIVES DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) 1979-05-01 US disclosed