SCHEMBL5142502

SCHEMBL5142502

O=C(O)C1CSc2ccccc2C1=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.38
ALDH1A1 P00352 3/20 0.38
HPGD P15428 3/20 0.38
PLA2G1B P04054 1/20 0.38
ATG4B Q9Y4P1 1/20 0.38
NOTUM Q6P988 1/20 0.38
POLB P06746 2/20 0.37
MIF P14174 1/20 0.37
HTT P42858 2/20 0.37
ALOX15 P16050 1/20 0.37
HBB P68871 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.36
KDM4E B2RXH2 1/20 0.36
NPC1 O15118 1/20 0.36
LMNA P02545 1/20 0.36
RAB9A P51151 1/20 0.36
TDP1 Q9NUW8 2/20 0.35
EDNRB P24530 1/20 0.35
EDNRA P25101 1/20 0.35
HTR2B P41595 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11637916 0.85 KDM4E (0.36) MAPTALDH1A1HPGDPLA2G1BATG4B
Fluoride SCHEMBL11417624 0.82 KDM4E (0.34) MAPTALDH1A1HPGDPLA2G1BATG4B
SCHEMBL10381714 0.81 MIF (0.34) MAPTALDH1A1HPGDPLA2G1BATG4B
SCHEMBL5141716 0.81 ALDH1A1 (0.40) MAPTALDH1A1HPGDPLA2G1BATG4B
SCHEMBL11417625 0.80 KDM4E (0.33) MAPTALDH1A1HPGDPLA2G1BATG4B
SCHEMBL8112023 0.79 KDM4E (0.34) MAPTALDH1A1HPGDPLA2G1BATG4B
SCHEMBL10382671 0.77 ALDH1A1 (0.50) MAPTALDH1A1HPGDKDM4ERAB9A
SCHEMBL68883 0.77 HPGD (0.37) MAPTALDH1A1HPGDNOTUMPOLB
SCHEMBL9348168 0.76 TP53 (0.40) MAPTALDH1A1HPGDPLA2G1BATG4B
SCHEMBL30460538 0.75 ALDH1A1 (0.41) MAPTALDH1A1HPGDKDM4EKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11874601-B2 Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-16 US disclosed
US-11874601-B2 Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-16 US disclosed
US-20220011665-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT TOKYO OHKA KOGYO CO., LTD. (JP) 2022-01-13 US disclosed
US-7291612-B2 Immunomodulatory compounds ACTIVE BIOTECH A.B. (SE) 2007-11-06 US disclosed
EP-1813616-A2 Pyrazoloquinolines with immunomodulating activity Active Biotech AB (SE) 2007-08-01 EP disclosed
EP-1562944-B1 PYRAZOLOQUINOLINES WITH IMMUNOMODULATING ACTIVITY ACTIVE BIOTECH AB (SE) 2007-02-14 EP disclosed
US-20060217411-A1 Immunomodulatory compounds ACTIVE BIOTECH AB 2006-09-28 US disclosed
US-7081456-B2 Immunomodulatory compounds ACTIVE BIOTECH AB (SE) 2006-07-25 US disclosed
US-20050203118-A9 Immunomodulatory compounds ACTIVE BIOTECH AB (SE) 2005-09-15 US disclosed
EP-1562944-A1 PYRAZOLOQUINOLINES WITH IMMUNOMODULATING ACTIVITY Active Biotech AB (SE) 2005-08-17 EP disclosed
US-20040116461-A1 Immunomodulatory compounds ACTIVE BIOTECH AB (SE) 2004-06-17 US disclosed
WO-2004048378-A1 PYRAZOLOQUINOLINES WITH IMMUNOMODULATING ACTIVITY ACTIVE BIOTECH AB (SE) 2004-06-10 WO disclosed
CN-1053922-A Therapeutical agent BOOTS CO PLC (GB) 1991-08-21 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050203118-A9 Immunomodulatory compounds CD40, ICOS, CD40LG MAPT 2428/4885ALDH1A1 3341/4885HPGD 2121/4885
US-20220011665-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT MRPS23, MRPS22, SLC11A2 MAPT 4785/4885ALDH1A1 2227/4885HPGD 4266/4885
US-11874601-B2 Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent MRPS23, MRPS22, SLC11A2 MAPT 4792/4885ALDH1A1 2173/4885HPGD 4260/4885
US-20060217411-A1 Immunomodulatory compounds CD40, ICOS, CD40LG MAPT 2428/4885ALDH1A1 3341/4885HPGD 2121/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.