SCHEMBL5143366

SCHEMBL5143366

C=CCOC(=O)C(=C)OC(=O)CC(C)=O

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.38
TSHR P16473 1/20 0.38
MGAM O43451 1/20 0.38
SI P14410 1/20 0.38
MGAM2 Q2M2H8 1/20 0.38
TDP1 Q9NUW8 1/20 0.35
MAPT P10636 1/20 0.34
CACNA1B Q00975 1/20 0.34
APBA1 Q02410 1/20 0.34
CYP3A4 P08684 1/20 0.33
PKM P14618 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL623935 0.80 MGAM (0.41) GAATSHRMGAMSIMGAM2
SCHEMBL9285596 0.80 TSHR (0.38) TSHRTDP1MAPTCACNA1BAPBA1
SCHEMBL9513 0.79 TSHR (0.50) GAATSHRMGAMSIMGAM2
SCHEMBL9294641 0.78 TDP1 (0.37) GAATSHRMGAMSIMGAM2
SCHEMBL5702374 0.77 TSHR (0.48) GAATSHRMGAMSIMGAM2
SCHEMBL1616122 0.77 TSHR (0.48) GAATSHRMGAMSIMGAM2
SCHEMBL5134550 0.77 TSHR (0.48) GAATSHRMGAMSIMGAM2
SCHEMBL1898254 0.77 MGAM (0.52) GAATSHRMGAMSIMGAM2
Acetone SCHEMBL28861611 0.77 TSHR (0.48) GAATSHRMGAMSIMGAM2
SCHEMBL2221470 0.77 TSHR (0.48) GAATSHRMGAMSIMGAM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023054029-A1 COVER FILM 富士フイルム株式会社 2023-04-06 WO disclosed
WO-2023054048-A1 COVER FILM 富士フイルム株式会社 2023-04-06 WO disclosed
US-9416300-B2 Low temperature curable adhesive compositions SIMPSON STRONG-TIE COMPANY, INC. (US) 2016-08-16 US disclosed
US-20150020965-A1 Low Temperature Curable Adhesive Compositions Simpson Strong-Tie Company. Inc. (US) 2015-01-22 US disclosed
US-8552119-B2 Low temperature curable adhesive compositions SIMPSON STRONG-TIE COMPANY, INC. (US) 2013-10-08 US disclosed
US-20130172486-A1 LOW TEMPERATURE CURABLE ADHESIVE COMPOSITIONS SIMPSON STRONG-TIE COMPANY, INC. (US) 2013-07-04 US disclosed
US-8334346-B2 Low temperature curable adhesive compositions SIMPSON STRONG-TIE COMPANY, INC. 2012-12-18 US disclosed
US-20120184681-A1 Low Temperature Curable Adhesive Compositions SIMPSON STRONG-TIE COMPANY, INC. (US) 2012-07-19 US disclosed
WO-2012097186-A1 LOW TEMPERATURE CURABLE ADHESIVE COMPOSITIONS SIMPSON STRONG-TIE COMPANY, INC. (US) 2012-07-19 WO disclosed
EP-1771521-A4 ENVIRONMENT -FRIENDLY POLLUTION-PROOF AGENT EXTRACTED FROM SARGASSUM UNIV SOONCHUNHYANG IND ACAD COOP FOUND (KR) 2008-02-20 EP disclosed
EP-0239149-B1 HIGH CONTRAST DEVELOPMENT OF SILVER HALIDE EMULSION MATERIAL AGFA-GEVAERT naamloze vennootschap (BE) 1992-12-30 EP disclosed
US-5141843-A Phenyl tetrazole anti-fogging agent AGFA-GEVAERT N. V. (BE) 1992-08-25 US disclosed
EP-0495253-A1 Method for the photographic production of silver images AGFA-GEVAERT N.V. (BE) 1992-07-22 EP disclosed
EP-0450198-A1 Developer liquid for high contrast development AGFA-GEVAERT N.V. (BE) 1991-10-09 EP disclosed
EP-0196705-B1 A METHOD OF EFFECTING HIGH CONTRAST DEVELOPMENT OF A IMAGE-WISE EXPOSED PHOTOGRAPHIC SILVER HALIDE EMULSION LAYER MATERIAL AGFA-GEVAERT N.V. (BE) 1988-08-10 EP disclosed
US-4756990-A Developer contains hydroquinone compound, auxilliary developer, free sulfite ions, antifogging agent, alkylene oxide containing polymer, inorganic alkali AGFA-GEVAERT N.V. (BE) 1988-07-12 US disclosed
US-4710451-A ALKALINE DEVELOPERS CONTAINING HYDROQUINONES, INORGANIC SULFITIES, NITROINDAZOLES, POLYOXYALKYLENE GLYCOLS AGFA-GEVAERT N.V. (BE) 1987-12-01 US disclosed
EP-0239149-A2 High contrast development of silver halide emulsion material AGFA-GEVAERT N.V. (BE) 1987-09-30 EP disclosed
EP-0196705-A1 A method of effecting high contrast development of a image-wise exposed photographic silver halide emulsion layer material AGFA-GEVAERT N.V. (BE) 1986-10-08 EP disclosed
US-RE29111-E CONTRAST EASTMAN KODAK COMPANY (US) 1977-01-11 US disclosed