SCHEMBL5143992

SCHEMBL5143992

[CH2]COc1cc(C(C)(C)CC)ccc1C(C)(C)CC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 6/20 0.46
NPSR1 Q6W5P4 5/20 0.46
SMN1; SMN2 Q16637 5/20 0.46
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
ALDH1A1 P00352 2/20 0.46
MAPT P10636 5/20 0.42
HTT P42858 3/20 0.42
UBE2N P61088 2/20 0.42
GLA P06280 1/20 0.42
MITF O75030 1/20 0.42
RAB9A P51151 4/20 0.38
RAD52 P43351 2/20 0.38
STAT3 P40763 1/20 0.38
RCE1 Q9Y256 1/20 0.38
APAF1 O14727 1/20 0.38
HSP90AA1 P07900 1/20 0.38
NOD2 Q9HC29 1/20 0.38
NPC1 O15118 3/20 0.38
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6759090 0.87 MAPK1 (0.46) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL8598929 0.87 MAPK1 (0.59) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL9769334 0.86 MAPK1 (0.44) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL6702685 0.86 MAPK1 (0.48) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL8765578 0.83 MAPK1 (0.48) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL6536662 0.82 MAPK1 (0.45) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL5143964 0.81 MAPK1 (0.49) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL5143965 0.81 SMN1; SMN2 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL5666258 0.81 MAPK1 (0.49) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL10594414 0.80 MAPK1 (0.48) MAPK1NPSR1SMN1; SMN2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7205083-B2 Recording material FUJIFILM CORPORATION (JP) 2007-04-17 US disclosed
EP-1253466-B1 Diazonium salt and heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 2006-05-31 EP disclosed
US-6875551-B2 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2005-04-05 US disclosed
US-6835692-B2 Heat-sensitive recording material containing oxonol dye FUJI PHOTO FILM CO., LTD. (JP) 2004-12-28 US disclosed
US-20040161694-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2004-08-19 US disclosed
US-6767862-B2 IMAGE STORABILITY AND LIGHTFASTNESS; DOES NOT HAVE BACKGROUND FOGGING FUJI PHOTO FILM CO., LTD. (JP) 2004-07-27 US disclosed
US-20040121909-A1 Heat-sensitive recording material containing oxonol dye FUJI PHOTO FILM CO., LTD. 2004-06-24 US disclosed
US-6749908-B2 LAMINATES/TRANSPARENCIES FOR OVERHEAD PROJECTORS FUJI PHOTO FILM CO., LTD. (JP) 2004-06-15 US disclosed
US-6746985-B2 COMPRISES DIAZO COMPOUND FOR COLOR-DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 2004-06-08 US disclosed
US-20040082472-A1 Recording material FUJI PHOTO FILM CO., LTD. 2004-04-29 US disclosed
US-20030166961-A1 Phenylurethane compounds and methods for producing same, asymmetric urea compounds and methods for producing same, barbituric acid derivative, and diazo thermal recording material containing the derivative FUJI PHOTO FILM CO., LTD. 2003-09-04 US disclosed
US-20030138720-A1 Multicolor heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-07-24 US disclosed
US-20030114305-A1 Multicolor heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-06-19 US disclosed
US-20030104939-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-06-05 US disclosed
US-20020183204-A1 Diazonium salt and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2002-12-05 US disclosed
US-20020172805-A1 Thermal recording material FUJI PHOTO FILM CO., LTD. 2002-11-21 US disclosed
US-20020161225-A1 Phenylurethane compounds and methods for producing same, asymmetric urea compounds and methods for producing same, barbituric acid derivative, and diazo thermal recording material containing the derivative FUJI PHOTO FILM CO., LTD. 2002-10-31 US disclosed
EP-1253022-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2002-10-30 EP disclosed
EP-1253466-A1 Diazonium salt and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2002-10-30 EP disclosed
US-6348433-B1 3-PHENYLSULFONYL-3,4-DIHYDROBENZO(E)TRIAZIN-4-ONE DERIVATIVES; STORAGE STABILITY; HIGH DENSITY COLOR DEVELOPMENT; RADIATION RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 2002-02-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030166961-A1 Phenylurethane compounds and methods for producing same, asymmetric urea compounds and methods for producing same, barbituric acid derivative, and diazo thermal recording material containing the derivative UROD, ATIC, DDC MAPK1 2583/4885NPSR1 3851/4885SMN1; SMN2 1869/4885
US-20020161225-A1 Phenylurethane compounds and methods for producing same, asymmetric urea compounds and methods for producing same, barbituric acid derivative, and diazo thermal recording material containing the derivative UROD, ATIC, DDC MAPK1 2583/4885NPSR1 3851/4885SMN1; SMN2 1869/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.