Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 6/20 | 0.47 |
| ▸ | PTGS2 | P35354 | 6/20 | 0.47 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.47 |
| ▸ | TTR | P02766 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.36 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | G6PD | P11413 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98390 | 0.98 | PTGS1 (0.48) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| Hydrochloric Acid SCHEMBL29730033 | 0.96 | PTGS1 (0.47) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| SCHEMBL13088296 | 0.84 | CA1 (0.55) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| Hydrochloric Acid SCHEMBL11333589 | 0.82 | CA1 (0.52) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| SCHEMBL13324860 | 0.81 | ALOX5 (0.48) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| SCHEMBL2618590 | 0.80 | MEN1 (0.35) | ALDH1A1LMNAPKMMEN1KMT2A | |
| SCHEMBL10022955 | 0.78 | CA1 (0.48) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| SCHEMBL6118107 | 0.78 | PTGS1 (0.52) | PTGS1PTGS2ALOX5TTRALDH1A1 | |
| SCHEMBL3190521 | 0.78 | ESR1 (0.47) | ALDH1A1LMNAHTTPKMMEN1 | |
| SCHEMBL3200037 | 0.74 | CES2 (0.39) | ALDH1A1LMNAMEN1KMT2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| US-7192685-B2 | Positive resist composition and method of forming resist pattern using the same. | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| US-20040197708-A1 | Positive resist composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| EP-1462858-A1 | Positive resist composition and method of forming resist pattern using the same | Fuji Photo Film Co., Ltd. (JP) | 2004-09-29 | — | — | EP | disclosed |