Propene

Propene

SCHEMBL5146965

C=CC.COCCOC(C)=O.O=C(O)OCCOC(=O)O

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
TSHR P16473 4/20 0.41
CHRM5 P08912 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
HTR1A P08908 1/20 0.36
CHRNB2 P17787 1/20 0.36
TBXA2R P21731 1/20 0.36
CHRNB4 P30926 1/20 0.36
CHRNA3 P32297 1/20 0.36
CHRNA7 P36544 1/20 0.36
CHRNA4 P43681 1/20 0.36
CHRNA10 Q9GZZ6 1/20 0.36
CHRNA9 Q9UGM1 1/20 0.36
GALR3 O60755 2/20 0.35
GAA P10253 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propene SCHEMBL487681 0.92 ALDH1A1 (0.46) ALDH1A1TSHRCHRM5CHRM1CHRM3
Propene SCHEMBL10277714 0.92 ALDH1A1 (0.46) ALDH1A1TSHRCHRM5CHRM1CHRM3
Propene SCHEMBL15666 0.92 ALDH1A1 (0.46) ALDH1A1TSHRCHRM5CHRM1CHRM3
Propene SCHEMBL219263 0.92 ALDH1A1 (0.46) ALDH1A1TSHRCHRM5CHRM1CHRM3
Propene SCHEMBL5145274 0.85 ALDH1A1 (0.38) ALDH1A1TSHRHSD17B10LMNAALOX15
2-Methoxyethanol SCHEMBL109126 0.85 TSHR (0.41) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ethyl Acetate SCHEMBL5148148 0.85 ALDH1A1 (0.54) ALDH1A1TSHRCHRM5CHRM1CHRM3
Acrylic Acid SCHEMBL5898430 0.84 ALDH1A1 (0.43) ALDH1A1TSHRCHRM5CHRM1CHRM3
Propene SCHEMBL8843123 0.83 ALDH1A1 (0.54) ALDH1A1TSHRCHRM5CHRM1CHRM3
Propene SCHEMBL8924981 0.83 ALDH1A1 (0.54) ALDH1A1TSHRCHRM5CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7285369-B2 photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability FUJIFILM CORPORATION (JP) 2007-10-23 US disclosed
US-7241551-B2 Positive-working resist composition FUJIFILM CORPORATION (JP) 2007-07-10 US disclosed
US-20050079441-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2005-04-14 US disclosed
US-20050064329-A1 Positive resist composition and pattern formation method using the same FUJI PHOTO FILM CO., LTD. 2005-03-24 US disclosed
US-20040248035-A1 Positive-working resist composition FUJI PHOTO FILM CO., LTD. 2004-12-09 US disclosed
US-20040009429-A1 Positive-working photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
US-6596458-B1 Used in an ultramicrolithography process or another photofabrication process for the production of very large scale integrated circuits or high capacity microchips FUJI PHOTO FILM CO., LTD. (JP) 2003-07-22 US disclosed
US-6589705-B1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-07-08 US disclosed
US-6506535-B1 A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels FUJI PHOTO FILM CO., LTD. (JP) 2003-01-14 US disclosed