Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5663548 | 0.78 | — | — | |
| SCHEMBL6685348 | 0.78 | DGAT1 (0.32) | DGAT1 | |
| SCHEMBL6685352 | 0.78 | DGAT1 (0.32) | DGAT1 | |
| SCHEMBL31174520 | 0.78 | DGAT1 (0.39) | DGAT1 | |
| SCHEMBL5144580 | 0.77 | DGAT1 (0.34) | DGAT1 | |
| SCHEMBL11365853 | 0.77 | DGAT1 (0.31) | DGAT1 | |
| SCHEMBL28499881 | 0.77 | DGAT1 (0.31) | DGAT1 | |
| SCHEMBL78520 | 0.76 | DGAT1 (0.46) | DGAT1 | |
| SCHEMBL6141069 | 0.76 | — | — | |
| SCHEMBL4497443 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1379331-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD. (CH) | 2004-01-14 | — | — | EP | claimed |
| US-6610465-B2 | One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-08-26 | — | — | US | claimed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | claimed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | claimed |
| US-9150491-B2 | Bicyclohexane derivative compound and manufacturing method of the same | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20130030211-A1 | BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-31 | — | — | US | disclosed |
| EP-2524907-A1 | BICYCLOHEXANE DERIVATIVE AND PRODUCTION METHOD FOR SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-7198880-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7078562-B2 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-07-18 | — | — | US | disclosed |
| US-7067692-B2 | Production method of adamantyl acrylate compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-06-27 | — | — | US | disclosed |
| US-20050158662-A1 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6835528-B2 | Has high transparency at a wavelength of 157 nm and which therefore permits a greater layer thickness in photolithography for the production of microchips | INFINEON TECHNOLOGIES AG (DE) | 2004-12-28 | — | — | US | disclosed |
| EP-1468981-A1 | Production method of adamantyl acrylate compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-10-20 | — | — | EP | disclosed |
| US-6767978-B2 | FLUORINATED (METH)ACRYLIC, TRIORGANOSILYL ACRYLIC AND (METH)ACRYLIC MONOMERS | ATOFINA CHEMICALS, INC. | 2004-07-27 | — | — | US | disclosed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| US-20030232277-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-12-18 | — | — | US | disclosed |
| US-20030157432-A1 | Fluorine-containing photoresist having reactive anchors for chemical amplification and improved copolymerization properties | POLARIS INNOVATIONS LIMITED (IE) | 2003-08-21 | — | — | US | disclosed |
| US-20030158358-A1 | Copolymers containing fluoro and silyl groups and their use in marine antifoulant composition | ARKEMA INC. | 2003-08-21 | — | — | US | disclosed |
| EP-1327640-A2 | Copolymers containing fluoro and silyl groups and their use in marine antifoulant composition | Atofina Chemicals, Inc. (US) | 2003-07-16 | — | — | EP | disclosed |
| US-20010010890-A1 | Polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130030211-A1 | BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE SAME | DDT, CYP1A2, CYP1B1 | DGAT1 1355/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.