SCHEMBL5147182

SCHEMBL5147182

C=CC1CC(C=C)C(C=C)CC1C=C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11081927 1.00
SCHEMBL8229678 0.83
SCHEMBL28250043 0.83
SCHEMBL12336204 0.83
SCHEMBL5147176 0.81 ALDH1A1 (0.32)
SCHEMBL24704539 0.80
SCHEMBL24704541 0.80
SCHEMBL24704594 0.80
SCHEMBL5145906 0.80
SCHEMBL5146020 0.74 CHRNB2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2772505-B1 PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND ADEKA CORP (JP) 2017-11-15 EP disclosed
CN-102566279-B Positive type photosensitive organic compound and permanent resist ASAHI DENKA CO., LTD. (JP) 2016-04-27 CN disclosed
US-9063415-B2 Photocurable resin composition and novel siloxane compound ADEKA CORPORATION (JP) 2015-06-23 US disclosed
EP-2772505-A1 PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND Adeka Corporation (JP) 2014-09-03 EP disclosed
US-20140205949-A1 PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND ADEKA CORPORATION (JP) 2014-07-24 US disclosed
US-20070066782-A1 Film-forming composition, insulating film and electronic device using the same FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed