SCHEMBL5147255

SCHEMBL5147255

CC1(OC(=O)C=Cc2ccccc2)C2CC3CC(C2)CC1C3

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.51
KMT2A Q03164 3/20 0.46
CYP17A1 P05093 2/20 0.43
CYP19A1 P11511 2/20 0.43
SMN1; SMN2 Q16637 4/20 0.43
MEN1 O00255 1/20 0.43
HTT P42858 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
GLA P06280 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
LMNA P02545 3/20 0.42
MAPT P10636 4/20 0.41
HDAC3 O15379 1/20 0.41
TNKS O95271 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HCAR2 Q8TDS4 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC10 Q969S8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5147251 1.00 CYP2C19 (0.51) CYP2C19KMT2ACYP17A1CYP19A1SMN1; SMN2
SCHEMBL7745860 0.80 CYP17A1 (0.41) CYP17A1CYP19A1SMN1; SMN2HTTLMNA
E-Methyl Cinnamate SCHEMBL22032604 0.79 ESR1 (0.58) CYP2C19KMT2ASMN1; SMN2GLATDP1
E-Methyl Cinnamate SCHEMBL22032603 0.79 ESR1 (0.58) CYP2C19KMT2ASMN1; SMN2GLATDP1
SCHEMBL6066461 0.78 KMT2A (0.48) CYP2C19KMT2ACYP19A1SMN1; SMN2MEN1
SCHEMBL1397068 0.78 KMT2A (0.48) CYP2C19KMT2ACYP19A1SMN1; SMN2MEN1
SCHEMBL6068257 0.76 CYP17A1 (0.49) KMT2ACYP17A1CYP19A1MEN1TDP1
Cinnamic Acid SCHEMBL6066456 0.73 HCAR2 (0.76) KMT2ASMN1; SMN2MEN1HTTNPSR1
Cinnamic Acid SCHEMBL6066454 0.73 HCAR2 (0.76) KMT2ASMN1; SMN2MEN1HTTNPSR1
SCHEMBL6713862 0.72 PPARG (0.45) CYP2C19SMN1; SMN2HTTLMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1770441-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2007-04-04 EP disclosed
US-20070072121-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed