Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.31 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.31 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | SCN1A | P35498 | 1/20 | 0.30 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.30 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27786969 | 0.91 | CYP17A1 (0.39) | CYP17A1CYP19A1 | |
| SCHEMBL4742222 | 0.86 | CYP17A1 (0.40) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL39900 | 0.85 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL5880684 | 0.81 | CYP17A1 (0.44) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL5147251 | 0.80 | CYP2C19 (0.51) | CYP17A1CYP19A1ALDH1A1LMNAHTT | |
| SCHEMBL5147255 | 0.80 | CYP2C19 (0.51) | CYP17A1CYP19A1ALDH1A1LMNAHTT | |
| SCHEMBL5880685 | 0.79 | CYP17A1 (0.43) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL439024 | 0.79 | CYP17A1 (0.43) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A | |
| SCHEMBL3394714 | 0.79 | CYP17A1 (0.36) | CYP17A1CYP19A1 | |
| SCHEMBL133979 | 0.78 | CYP17A1 (0.42) | CYP17A1CYP19A1HSD11B1SCN1ASCN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6329125-B2 | AN ALKALI-INSOLUBLE COMPOUND HAVING A PROTECTED ALKALI SOLUBLE GROUP IN WHICH PROTECTIVE GROUP CONTAINS AN ALICYCLIC HYDROCARBON GROUP HAVING BONDED TO A CARBON ATOM AND CLEAVED UPON ACTION OF AN ACID GENERATED FROM A PHOTOACID GEENERATOR | FUJITSU LIMITED (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010003640-A1 | Chemically amplified resist compositions and process for the formation of resist patterns | FUJITSU LIMITED (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6200725-B1 | A SUBSTITUTED ALICYCLIC HYDROCARBON GROUP WHICH ACTS AS A PROTECTIVE GROUP TO AN ADDITIONAL POLYMER WHEN EXPOSED TO A POLYACID GENERATOR WHICH IS CAPABLE OF DECOMPOSING TO PATTERN RADIATION EPOSURE, PRODUCES ACID, CAPABLE OF DEPROTECTION | FUJITSU LIMITED (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | disclosed |
| US-5968713-A | ALKALI DEVELOPED RESISTS AND FILM FORMING COMPOUNDS WITH ALKALI SOLUBLE GROUPS AND GENERATION | FUJITSU LIMITED (JP) | 1999-10-19 | — | — | US | disclosed |