Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 7/20 | 0.65 |
| ▸ | IDO1 | P14902 | 3/20 | 0.65 |
| ▸ | MEN1 | O00255 | 3/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.65 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.65 |
| ▸ | CES1 | P23141 | 2/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.65 |
| ▸ | MAPT | P10636 | 2/20 | 0.65 |
| ▸ | HPGD | P15428 | 2/20 | 0.65 |
| ▸ | PTPN22 | Q9Y2R2 | 2/20 | 0.65 |
| ▸ | LMNA | P02545 | 1/20 | 0.65 |
| ▸ | BCHE | P06276 | 1/20 | 0.65 |
| ▸ | POLB | P06746 | 1/20 | 0.65 |
| ▸ | THRB | P10828 | 1/20 | 0.65 |
| ▸ | PKM | P14618 | 1/20 | 0.65 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.65 |
| ▸ | ACHE | P22303 | 1/20 | 0.65 |
| ▸ | RECQL | P46063 | 1/20 | 0.65 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.65 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,2-Naphthoquinone SCHEMBL10930514 | 0.94 | PTPRC (0.61) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL203171 | 0.93 | PTPRC (0.74) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL9225610 | 0.92 | PTPRC (0.77) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL9225602 | 0.88 | PTPRC (0.83) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29368763 | 0.88 | PTPRC (0.83) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29179724 | 0.84 | PTPRC (0.77) | PTPRCIDO1MEN1KMT2AKDM4E | |
| Naphthoquinone SCHEMBL1395610 | 0.84 | IDO1 (0.54) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL20212026 | 0.84 | PTPRC (0.83) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL23780312 | 0.81 | PTPRC (0.71) | PTPRCIDO1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL8434680 | 0.81 | PTPRC (0.61) | PTPRCIDO1MEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6376150-B1 | MIXTURE CONTAINING DIAZO RESIN | LASTRA S.P.A. (IT) | 2002-04-23 | — | — | US | claimed |
| US-5407780-A | High sensitivity, resolution and heat resistance | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-18 | — | — | US | claimed |
| US-5403696-A | Mixture of phenolic resin obtained by condensation reaction of formaldehyde with phenol mixture of meta-cresol and 2-tert-butyl-4-methylphenol or 2-tert-butyl-6-methylphenol and 1,2-quinone diazide compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-04-04 | — | — | US | claimed |
| US-5288587-A | Novolaks; improved resolution and heat resistance | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-02-22 | — | — | US | claimed |
| US-4292392-A | ETCHABLE, DEVELOPABLE AND PERMEABLE USING AN ALKALINE AQUEOUS SOLUTION; CONTRAST | FUJI PHOTO FILM CO., LTD. (JP) | 1981-09-29 | — | — | US | claimed |
| JP-60201338-A | — | — | None | — | — | JP | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| US-11892773-B2 | Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-4063954-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-04 | — | — | EP | disclosed |
| EP-3398983-B1 | POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | SHINETSU CHEMICAL CO (JP) | 2023-09-27 | — | — | EP | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| CN-111830785-B | Resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protecting film, and electronic component | 信越化学工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| EP-0443607-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-08-28 | — | — | EP | disclosed |
| EP-0435181-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-07-03 | — | — | EP | disclosed |
| EP-0422667-A1 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-04-17 | — | — | EP | disclosed |
| EP-0416544-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-13 | — | — | EP | disclosed |
| EP-0415266-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-06 | — | — | EP | disclosed |
| EP-0384481-A1 | Positive photoresist composition and method for formation of resist pattern | Chisso Corporation (JP) | 1990-08-29 | — | — | EP | disclosed |
| EP-0358871-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-03-21 | — | — | EP | disclosed |
| JP-S60201338-A | PHOTODECOMPOSABLE PHOTORESIST | MIDORI KAGAKU KENKYUSHO:KK | 1985-10-11 | — | — | JP | disclosed |